发明授权
US6121595A Applicator to provide uniform electric and magnetic fields over a large
area and for continuous processing
失效
施加器在大面积上提供均匀的电场和磁场,并用于连续加工
- 专利标题: Applicator to provide uniform electric and magnetic fields over a large area and for continuous processing
- 专利标题(中): 施加器在大面积上提供均匀的电场和磁场,并用于连续加工
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申请号: US2714申请日: 1998-01-05
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公开(公告)号: US6121595A公开(公告)日: 2000-09-19
- 发明人: David Andrew Lewis , Alfred Viehbeck , Stanley Joseph Whitehair
- 申请人: David Andrew Lewis , Alfred Viehbeck , Stanley Joseph Whitehair
- 申请人地址: NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: NY Armonk
- 主分类号: B01J19/12
- IPC分类号: B01J19/12 ; G01N22/00 ; H05B6/68 ; H05B6/70 ; H05B6/74 ; H05B6/80
摘要:
A microwave applicator that provides a substantially uniform microwave field distribution over a large area, includes an elongated chamber, preferably operating in the length independent mode. A microwave source generates a microwave field at an output frequency. A waveguide or coaxial cable directs the microwave field from the microwave source into the elongated chamber, either through a side launch, end launch or multi launch. A frequency of the microwave field in the elongated chamber and the output frequency of the microwave source are matched through the use of controlled feedback of critical material and process parameters.
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