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US6124157A Integrated non-volatile and random access memory and method of forming the same 失效
集成的非易失性和随机存取存储器及其形成方法

Integrated non-volatile and random access memory and method of forming
the same
摘要:
A method of forming non-volatile memory (e.g., an EEPROM device) and a CMOS device (e.g., a RAM), on a single die or chip, and a structure formed by the method. In one embodiment, the control gate of the storage transistor as well as the isolation gate of the isolation transistor may be formed during the same manufacturing process step, and thus may be formed of the same gate poly material and may have similar thickness.
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