Invention Grant
- Patent Title: Method of making an electronic device and the same
- Patent Title (中): 制造电子设备的方法及其制造方法
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Application No.: US329319Application Date: 1999-06-10
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Publication No.: US6127246APublication Date: 2000-10-03
- Inventor: Hiroshi Fukuda
- Applicant: Hiroshi Fukuda
- Applicant Address: JPX Tokyo
- Assignee: Hitachi, Ltd.
- Current Assignee: Hitachi, Ltd.
- Current Assignee Address: JPX Tokyo
- Main IPC: H01L21/335
- IPC: H01L21/335 ; H01L29/12 ; H01L29/76 ; H01L29/788 ; H01L21/20
Abstract:
Laminated layers including semiconductor or metal thin layers and insulative thin layers are formed on a substrate and after the laminated layers are patterned, and the laminated layers are oxidized from their side to form an oxidized area. This way, a 0-dimensional quantum box or one-dimensional quantum line having fine tunnel junctions surrounded by the oxidized area and a 0-dimension quantum box or a one-dimensional quantum line made of semiconductor or metal area interposed between the oxidized area and the insulative thin layers are formed in the laminated layers.
Public/Granted literature
- US5495111A Crystal array based localizer for tissue sampling Public/Granted day:1996-02-27
Information query
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