Invention Grant
- Patent Title: Gas tube with heating apparatus
- Patent Title (中): 带加热装置的气管
-
Application No.: US257577Application Date: 1999-02-25
-
Publication No.: US6129043APublication Date: 2000-10-10
- Inventor: Chien-Hsin Lai , Fu-Yang Yu
- Applicant: Chien-Hsin Lai , Fu-Yang Yu
- Applicant Address: TWX Hsinchu
- Assignee: United Microelectronics Corp.
- Current Assignee: United Microelectronics Corp.
- Current Assignee Address: TWX Hsinchu
- Main IPC: C23C16/452
- IPC: C23C16/452 ; C23C16/455 ; C23C10/00 ; F17D1/04 ; F28C1/14
Abstract:
A gas tube with heating apparatus. The gas tube is applicable in a chemical vapor deposition machine. The gas comprises a gas circulating tube and a coaxial gas tube invaginating a gas transporting tube therein. A heater is installed in the gas circulating tube, while the coaxial tube is covered by a thermal insulating layer. In addition, a control valve, a pressure gauge, and a particle trap are installed in a gas supplying tube connecting with the gas circulating tube.
Public/Granted literature
- US5449713A Ethylene/.alpha.-olefin/diene rubber composition and use of the same Public/Granted day:1995-09-12
Information query
IPC分类:
