Invention Grant
US6131421A Dry cleaning system using densified carbon dioxide and a surfactant
adjunct containing a CO.sub.2 -philic and a CO.sub.2 -phobic group
有权
使用致密二氧化碳的干洗系统和含有二氧化碳亲和和二氧化碳恐怕基团的表面活性剂助剂
- Patent Title: Dry cleaning system using densified carbon dioxide and a surfactant adjunct containing a CO.sub.2 -philic and a CO.sub.2 -phobic group
- Patent Title (中): 使用致密二氧化碳的干洗系统和含有二氧化碳亲和和二氧化碳恐怕基团的表面活性剂助剂
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Application No.: US388889Application Date: 1999-09-02
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Publication No.: US6131421APublication Date: 2000-10-17
- Inventor: Sharon Harriott Jureller , Judith Lynne Kerschner , Dennis Stephen Murphy
- Applicant: Sharon Harriott Jureller , Judith Lynne Kerschner , Dennis Stephen Murphy
- Applicant Address: NY New York
- Assignee: Lever Brothers Company, Division of Conopco, Inc.
- Current Assignee: Lever Brothers Company, Division of Conopco, Inc.
- Current Assignee Address: NY New York
- Main IPC: D06L1/00
- IPC: D06L1/00 ; D06L1/04 ; D06L3/02 ; D06F43/02 ; C11D1/72 ; C11D1/722 ; C11D1/82 ; C11D3/16
Abstract:
A system for dry cleaning soils from fabrics comprising densified carbon dioxide and a surfactant in the densified CO.sub.2. The densified carbon dioxide is in a temperature range of about -78.5.degree. C. to about 100.degree. C. and a pressure range of about 14.7 to about 10,000 psi. At least 0.1% by volume of a modifier is preferably present. The surfactant has a polysiloxane, a branched polyalkylene oxide or a halocarbon group which is a functional CO.sub.2 -philic moiety connected to a CO.sub.2 -phobic functional moiety. The surfactant either exhibits an HLB of less than 15 or has a ratio of siloxyl to substituted siloxyl groups of greater than 0.5:1.
Public/Granted literature
- US5646717A Image forming apparatus having charging member Public/Granted day:1997-07-08
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