发明授权
- 专利标题： Method and apparatus for producing extreme ultra-violet light for use in photolithography
- 专利标题（中）： 用于制造用于光刻的极紫外光的方法和装置
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申请号： US794802申请日： 1997-02-04
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公开(公告)号： US6133577A公开(公告)日： 2000-10-17
- 发明人: Robert M. Gutowski , Vincent Calia , Alan M. Todd
- 申请人： Robert M. Gutowski , Vincent Calia , Alan M. Todd
- 申请人地址： NY Bethpage
- 专利权人： Advanced Energy Systems, Inc.
- 当前专利权人： Advanced Energy Systems, Inc.
- 当前专利权人地址： NY Bethpage
- 主分类号： G21G4/00
- IPC分类号： G21G4/00 ; G03F7/20 ; G21K5/00 ; H01L21/027 ; H01S3/03 ; H01S3/22 ; H05G2/00
摘要：
A method and apparatus for producing extreme ultra-violet light comprising a nozzle for flowing a gas at a supersonic velocity, a source for directing a radiated energy beam into the flowing gas to stimulate emission of extreme ultra-violet light therefrom, and a diffuser for capturing a substantial portion of the gas so as to mitigate contamination caused thereby. The extreme ultra-violet light so produced is suitable for use in photolithography for integrated circuit fabrication and the like.
公开/授权文献
- US4654887A Radio frequency mixer 公开/授权日：1987-03-31
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