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1.发明授权Method and apparatus for producing extreme ultra-violet light for use in photolithography 失效用于制造用于光刻的极紫外光的方法和装置
公开(公告)号：US6133577A
公开(公告)日：2000-10-17
申请号：US794802
申请日：1997-02-04
申请人： Robert M. Gutowski , Vincent Calia , Alan M. Todd
发明人： Robert M. Gutowski , Vincent Calia , Alan M. Todd
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70916 , H05G2/006 , H05G2/008
摘要： A method and apparatus for producing extreme ultra-violet light comprising a nozzle for flowing a gas at a supersonic velocity, a source for directing a radiated energy beam into the flowing gas to stimulate emission of extreme ultra-violet light therefrom, and a diffuser for capturing a substantial portion of the gas so as to mitigate contamination caused thereby. The extreme ultra-violet light so produced is suitable for use in photolithography for integrated circuit fabrication and the like.
摘要翻译： 一种用于生产极紫外光的方法和装置，包括用于以超音速流动气体的喷嘴，用于将辐射能量束引导到流动气体中的源，以刺激从其发射极紫外光的散射器; 捕获大部分气体，以便减轻由此引起的污染。 如此制造的极紫外光适用于用于集成电路制造等的光刻。
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2.发明授权Fluid nozzle system and method in an emitted energy system for photolithography 失效用于光刻的发射能量系统中的流体喷嘴系统和方法公开(公告)号：US06437349B1
公开(公告)日：2002-08-20
申请号：US09598664
申请日：2000-06-20
IPC分类号： H05H134
CPC分类号： H05G2/003 , B05B1/005 , B82Y10/00 , G03F7/70033 , G03F7/70858 , H05G2/006
摘要： An emitted energy system for use in photolithography may include a fluid nozzle. A nozzle and its method of manufacture are provided. A nozzle (22) may include a nozzle cavity (110) disposed within a nozzle body (100) between an up-stream end (102) and a down-stream end (104). A nozzle passage (118) may be defined within the nozzle cavity (110) and extend a longitudinal length (120) from the down-stream end (104) of the nozzle body (100) into the nozzle cavity (110). A discharge orifice (124) may also be defined at the down-stream end (104) of the nozzle cavity (110) and have an associated width (126). The width (126) of the discharge orifice (124) may be substantially less than the longitudinal length (120) of the nozzle passage (118).
摘要翻译： 用于光刻的发射能量系统可以包括流体喷嘴。 提供喷嘴及其制造方法。 喷嘴（22）可以包括设置在上游端（102）和下游端（104）之间的喷嘴体（100）内的喷嘴腔（110）。 喷嘴通道（118）可以限定在喷嘴空腔（110）内并且将纵向长度（120）从喷嘴体（100）的下游端（104）延伸到喷嘴腔（110）中。 排出口（124）也可以限定在喷嘴腔（110）的下游端（104）处，并且具有相关联的宽度（126）。 排出孔（124）的宽度（126）可以基本上小于喷嘴通道（118）的纵向长度（120）。
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3.发明授权Holder assembly system and method in an emitted energy system for photolithography 失效用于光刻的发射能量系统中的支架组装系统和方法公开(公告)号：US06353232B2
公开(公告)日：2002-03-05
申请号：US09772447
申请日：2001-01-29
IPC分类号： H05H134
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/008
摘要： An emitted energy system for use in photolithography may include a holder assembly operable to precisely align a diffuser and a nozzle. In accordance with one embodiment of the present invention, a holder assembly (30) may comprise a nozzle mounting system (414) coupled to a housing assembly (400) to secure a nozzle (22). A diffuser mounting system (430) may be coupled to the housing assembly (400) to secure a diffuser (28). An alignment system (450) may operate to align the nozzle (22) and the diffuser (28) in a spatial relationship with each other to optimize operation of the diffuser (28) in relation to the nozzle (22).
摘要翻译： 用于光刻的发射能量系统可以包括可操作以精确对准漫射器和喷嘴的保持器组件。 根据本发明的一个实施例，保持器组件（30）可以包括联接到壳体组件（400）以固定喷嘴（22）的喷嘴安装系统（414）。 扩散器安装系统（430）可以联接到壳体组件（400）以固定扩散器（28）。 对准系统（450）可以操作以使喷嘴（22）和扩散器（28）彼此空间关系对准，以优化扩散器（28）相对于喷嘴（22）的操作。
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公开(公告)号：US6065203A
公开(公告)日：2000-05-23
申请号：US54987
申请日：1998-04-03
CPC分类号： H05G2/003 , B05B1/005 , B82Y10/00 , G03F7/70033 , G03F7/70858 , Y10T29/49908
摘要： A method of fabricating very small diameter deep passages is provided. The method of fabricating very small diameter deep passages may include fabricating a recess (206) in a first side (202) of an article (200). An article passage (216) may be fabricated between a second side (204) of the article (200) and the recess (206). An insert (220) may be provided sized to fit the recess (206). An insert passage (230) may be fabricated in the insert (220). The insert (220) may then be secured in the recess (206), with the insert passage (230) and the article passage (216) aligned.
摘要翻译： 提供了制造非常小直径的深通道的方法。 制造非常小直径的深通道的方法可以包括在物品（200）的第一侧（202）中制造凹部（206）。 物品通道（216）可以在制品（200）的第二侧（204）和凹部（206）之间制造。 可以提供尺寸设计成适合凹部（206）的插入件（220）。 可以在插入件（220）中制造插入通道（230）。 插入件（220）然后可以被固定在凹槽（206）中，插入通道（230）和制品通道（216）对齐。
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公开(公告)号：US06180952B2
公开(公告)日：2001-01-30
申请号：US09055035
申请日：1998-04-03
IPC分类号： H05H134
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/008
摘要： An emitted energy system for use in photolithography may include a holder assembly operable to precisely align a diffuser and a nozzle. In accordance with one embodiment of the present invention, a holder assembly (30) may comprise a nozzle mounting system (414) coupled to a housing assembly (400) to secure a nozzle (22). A diffuser mounting system (430) may be coupled to the housing assembly (400) to secure a diffuser (28). An alignment system (450) may operate to align the nozzle (22) and the diffuser (28) in a spatial relationship with each other to optimize operation of the diffuser (28) in relation to the nozzle (22).
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公开(公告)号：US6105885A
公开(公告)日：2000-08-22
申请号：US54831
申请日：1998-04-03
CPC分类号： H05G2/003 , B05B1/005 , B82Y10/00 , G03F7/70033 , G03F7/70858 , H05G2/006
摘要： An emitted energy system for use in photolithography may include a fluid nozzle. A nozzle and its method of manufacture are provided. A nozzle (22) may include a nozzle cavity (110) disposed within a nozzle body (100) between an up-stream end (102) and a down-stream end (104). A nozzle passage (118) may be defined within the nozzle cavity (110) and extend a longitudinal length (120) from the down-stream end (104) of the nozzle body (100) into the nozzle cavity (110). A discharge orifice (124) may also be defined at the down-stream end (104) of the nozzle cavity (110) and have an associated width (126). The width (126) of the discharge orifice (124) may be substantially less than the longitudinal length (120) of the nozzle passage (118).
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