发明授权
- 专利标题： Resist processing method
- 专利标题（中）： 抗蚀加工方法
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申请号： US81016申请日： 1998-05-19
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公开(公告)号： US6143478A公开(公告)日： 2000-11-07
- 发明人: Takayuki Toshima , Nobuo Konishi
- 申请人： Takayuki Toshima , Nobuo Konishi
- 申请人地址： JPX Tokyo
- 专利权人： Tokyo Electron Limited
- 当前专利权人： Tokyo Electron Limited
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX9-144552 19970520
- 主分类号： H01L21/027
- IPC分类号： H01L21/027 ; G03F7/16 ; G03F7/40
摘要：
A resist processing method includes (a), to a substrate having a circuit pattern with an uneven surface formed thereon, coating a photoresist solution to, by doing so, form a photoresist film, (b) subjecting the substrate to heat processing to cause a portion of the photoresist film to be chemically modified to create a modified resist layer of a substantially uniform thickness from the uneven surface of the circuit pattern, and (c) selectively removing only a resist portion unmodified at the step (b) to leave a modified resist layer on the uneven surface of the circuit pattern.
公开/授权文献
- USD410071S Faucet spout 公开/授权日：1999-05-18
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