- 专利标题： Ester compounds, polymers, resist composition and patterning process
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申请号： US307767申请日： 1999-05-10
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公开(公告)号： US6147249A公开(公告)日： 2000-11-14
- 发明人: Takeru Watanabe , Takeshi Kinsho , Tsunehiro Nishi , Mutsuo Nakashima , Koji Hasegawa , Jun Hatakeyama
- 申请人： Takeru Watanabe , Takeshi Kinsho , Tsunehiro Nishi , Mutsuo Nakashima , Koji Hasegawa , Jun Hatakeyama
- 申请人地址： JPX Tokyo
- 专利权人： Shin-Etsu Chemical Co., Ltd.
- 当前专利权人： Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX10-145080 19980511; JPX10-292575 19981014
- 主分类号： C07C69/03
- IPC分类号： C07C69/03 ; C07C69/00 ; C07C69/753 ; C08F32/08 ; G03F7/004 ; G03F7/039 ; C07C69/74
摘要：
A novel ester compound having an alkylcycloalkyl or alkylcycloalkenyl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.
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