发明授权
US6150069A Oxabicyclo compound, a polymer-containing said compound, and a
photoresist micro pattern forming method using the same
有权
氧杂双环化合物，含聚合物的所述化合物和使用其的光致抗蚀剂微图案形成方法
- 专利标题： Oxabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same
- 专利标题（中）： 氧杂双环化合物，含聚合物的所述化合物和使用其的光致抗蚀剂微图案形成方法
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申请号： US311488申请日： 1999-05-13
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公开(公告)号： US6150069A公开(公告)日： 2000-11-21
- 发明人: Jae Chang Jung , Chi Hyeong Roh , Min Ho Jung , Geun Su Lee , Ki Ho Baik
- 申请人： Jae Chang Jung , Chi Hyeong Roh , Min Ho Jung , Geun Su Lee , Ki Ho Baik
- 申请人地址： KRX
- 专利权人： Hyundai Electronics Industries Co., Ltd.
- 当前专利权人： Hyundai Electronics Industries Co., Ltd.
- 当前专利权人地址： KRX
- 优先权： KRX98-17211 19980513
- 主分类号： C07D493/08
- IPC分类号： C07D493/08 ; C08F22/06 ; C08F32/00 ; C08L45/00 ; G03F7/004 ; G03F7/038 ; G03F7/039
摘要：
The present invention relates to oxabicyclo compounds and a method of preparing the same. The compounds of the present invention can be used as monomers for preparing a photoresist resin which is useful in photolithography processes using ultra-violet light sources, and are represented by the following Formula 1: ##STR1## wherein, R.sub.1 and R.sub.2 are the same or different, and represent a hydrogen or a C.sub.1 -C.sub.4 straight or branched chain substituted alkyl group; and m is a number from 1 to 4.In other embodiments, the present invention relates to an ArF or a KrF photoresist resin containing an oxabicyclo monomer, and compositions and photoresist micro pattern forming methods using the same.
公开/授权文献
- US5505332A Vending machine and method of operating such 公开/授权日：1996-04-09
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