发明授权
US6154873A Layout designing method and layout designing apparatus 失效
布局设计方法及布图设计

  • 专利标题: Layout designing method and layout designing apparatus
  • 专利标题(中): 布局设计方法及布图设计
  • 申请号: US92090
    申请日: 1998-06-05
  • 公开(公告)号: US6154873A
    公开(公告)日: 2000-11-28
  • 发明人: Naoya Takahashi
  • 申请人: Naoya Takahashi
  • 申请人地址: JPX Tokyo
  • 专利权人: NEC Corporation
  • 当前专利权人: NEC Corporation
  • 当前专利权人地址: JPX Tokyo
  • 优先权: JPX9-148124 19970605
  • 主分类号: H01L21/82
  • IPC分类号: H01L21/82 G06F17/50
Layout designing method and layout designing apparatus
摘要:
A hierarchical layout designing method for an LSI has the step of determining the layout positions and shapes of hard macro blocks and a soft macro block, the step of forming a wiring which connects the hard macro blocks to each other and a path which passes above the soft macro block, the step of evaluating the influence which a wiring passing above the soft macro block will influence on the internal wiring of the soft macro block, a determination step of determining the extending direction in which the cell rows are to extend in the soft macro block, the step of forming in the soft macro block the cell rows in which cells are to be placed, and the step of calculating a first cost "COST x" in the case where the cell rows are formed extending in an x-axial direction and a second cost "COST y" in the case where the cell rows are formed extending in any-axial direction. By the determination step, the first cost "COST x" and the second cost "COST y" are compared with each other, and a direction in which the lower one of the first and second costs is attained is determined as the extending direction of the cell rows.
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