发明授权
US6159655A Positive photoresist composition for exposure to far ultraviolet light
失效
用于暴露于远紫外光的正性光致抗蚀剂组合物
- 专利标题： Positive photoresist composition for exposure to far ultraviolet light
- 专利标题（中）： 用于暴露于远紫外光的正性光致抗蚀剂组合物
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申请号： US264036申请日： 1999-03-08
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公开(公告)号： US6159655A公开(公告)日： 2000-12-12
- 发明人: Kenichiro Sato
- 申请人： Kenichiro Sato
- 申请人地址： JPX Kanagawa
- 专利权人： Fuji Photo Film Co., Ltd.
- 当前专利权人： Fuji Photo Film Co., Ltd.
- 当前专利权人地址： JPX Kanagawa
- 优先权： JPX10-072478 19980320; JPX10-136918 19980519
- 主分类号： C08F222/10
- IPC分类号： C08F222/10 ; C08F232/00 ; G03F7/004 ; G03F7/039 ; H01L21/027 ; G03C1/73 ; G03C1/72
摘要：
A positive photoresist composition position for exposure to far ultraviolet light, which comprises a resin decomposing by the action of an acid to increase its solubility in an alkali, and a compound generating an acid by irradiation with an actinic ray or radiation; with the resin comprising repeating units having particular structures, including particular alicyclic structures, and groups decomposing by the action of an acid.
公开/授权文献
- US4858078A Solid electrolytic capacitor 公开/授权日：1989-08-15
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