发明授权
- 专利标题: Device for plasma generation
- 专利标题(中): 等离子体发生装置
-
申请号: US217900申请日: 1998-12-22
-
公开(公告)号: US6161501A公开(公告)日: 2000-12-19
- 发明人: Michael Liehr
- 申请人: Michael Liehr
- 申请人地址: DEX Hanau
- 专利权人: Leybold Systems GmbH
- 当前专利权人: Leybold Systems GmbH
- 当前专利权人地址: DEX Hanau
- 优先权: DEX19801366 19980116
- 主分类号: H05H1/46
- IPC分类号: H05H1/46 ; C23C16/00
摘要:
In a device for generating plasma in a vacuum chamber (9) with the aid of alternating electromagnetic fields, at least one rod-shaped conductor (7) is guided inside of a tube (16) made of insulating material through the vacuum chamber (9), the insulating tube (16) is held at its ends in one or in the opposing walls (6;17,17a) of the vacuum chamber (9) and is sealed off, wherein one or both ends of the rod-shaped conductor (7) are connected to a generator (18,19), wherein one or both ends of the rod-shaped conductor (7) are surrounded by outer conductors (20,21), each extending from the generator (18,19) to the respective inside wall surface (22,22a) of the vacuum chamber (9), wherein, in the area of the wall passages, the rod-shaped conductor (7) connected to the sources (18,19) and the outer conductors (20,21) surrounding it are each provided with a branch constituting a bypass (23,24), wherein a second rod-shaped conductor (26) extending into or through the vacuum chamber (9) surrounded by a second insulating tube (25), is connected to each of these bypasses (23,24), wherein the length of each bypass amounts to .lambda./2.
公开/授权文献
信息查询
IPC分类: