发明授权
- 专利标题: Fine detail photoresist barrier
- 专利标题(中): 细节光刻胶屏障
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申请号: US121258申请日: 1998-07-22
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公开(公告)号: US06161923A公开(公告)日: 2000-12-19
- 发明人: David Pidwerbecki , Gerald T. Kraus , Paul J. Benning , Diana D. Granger , Joe E. Stout
- 申请人: David Pidwerbecki , Gerald T. Kraus , Paul J. Benning , Diana D. Granger , Joe E. Stout
- 申请人地址: CA Palo Alto
- 专利权人: Hewlett-Packard Company
- 当前专利权人: Hewlett-Packard Company
- 当前专利权人地址: CA Palo Alto
- 主分类号: B41J2/14
- IPC分类号: B41J2/14 ; B41J2/05
摘要:
The photoresist barrier layer of an inkjet printer printhead is processed to enable channels narrower than a predetermined width in the barrier layer to be created without blockage. Relatively large volumes of photoresist which form a wall of the channel are exposed to a partial exposure of electomagnetic radiation to yield a reduced concentration of photoresist barrier layer in the large volume.
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