发明授权
- 专利标题: Method for manufacturing a capacitor
- 专利标题(中): 制造电容器的方法
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申请号: US332747申请日: 1999-06-14
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公开(公告)号: US6165832A公开(公告)日: 2000-12-26
- 发明人: Kazuyoshi Honda , Noriyasu Echigo , Masaru Odagiri , Nobuki Sunagare , Toru Miyake
- 申请人: Kazuyoshi Honda , Noriyasu Echigo , Masaru Odagiri , Nobuki Sunagare , Toru Miyake
- 申请人地址: JPX Osaka
- 专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人地址: JPX Osaka
- 优先权: JPX10-166539 19980615
- 主分类号: H01G4/30
- IPC分类号: H01G4/30 ; H01L21/8242
摘要:
A method for manufacturing a capacitor includes the step of depositing metal thin film layers and resin layers alternating with each other, thereby forming a layered product. The thickness of the resin layer and the metal thin film or the width of margins are measured during the deposition. At a predetermined point in the process of the deposition, the number of layers to be deposited further is determined, based on the measured values and an intended electrostatic capacitance or deposition thickness. The thus obtained capacitor has the intended electrostatic capacitance or deposition thickness with a small dispersion.
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