Invention Grant
- Patent Title: Micro-processing method using a probe
- Patent Title (中): 使用探针的微处理方法
-
Application No.: US88758Application Date: 1998-06-02
-
Publication No.: US6166386APublication Date: 2000-12-26
- Inventor: Koji Yano , Ryo Kuroda
- Applicant: Koji Yano , Ryo Kuroda
- Applicant Address: JPX Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JPX Tokyo
- Priority: JPX9-159144 19970602; JPX9-159217 19970602
- Main IPC: B81C1/00
- IPC: B81C1/00 ; B82B3/00 ; G01Q80/00 ; H01J37/30 ; H01J37/317 ; H01L21/00
Abstract:
A micro-processing method is provided for forming a structure adapted to confine electrons within a micro-region. The method comprises steps of arranging a probe oppositely relative to a non-electroconductive thin film arranged on an electroconductive substrate, placing the probe on or near the surface to be processed of the non-electroconductive thin film, applying a voltage between the probe and the substrate to form an enhanced electroconductivity region as compared with the remaining area in the non-electroconductive thin film, and oxidizing the interface of the substrate and the non-electroconductive thin film.
Public/Granted literature
- USD429130S Wire insertion impact tool Public/Granted day:2000-08-08
Information query