发明授权
- 专利标题： Photoresist composition and process for its use
- 专利标题（中）： 光刻胶组成及其使用方法
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申请号： US08928308申请日： 1997-09-12
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公开(公告)号： US06177228B1公开(公告)日： 2001-01-23
- 发明人: Robert David Allen , Richard Anthony DiPietro , Ratnam Sooriyakumaran , Thomas I. Wallow , Gregory Michael Wallraff
- 申请人： Robert David Allen , Richard Anthony DiPietro , Ratnam Sooriyakumaran , Thomas I. Wallow , Gregory Michael Wallraff
- 主分类号： G03F7004
- IPC分类号： G03F7004
摘要：
The present invention relates to a radiation-sensitive resist composition comprising a radiation-sensitive acid generator and a copolymer binder formed by the reaction of (a) an acrylate or methacrylate monomer having a photogenerated acid cleavable substituent and (b) an acrylate or methacrylate monomer having a polar non photoacid cleavable substituent.
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