发明授权
US06194826B1 Process for preparing phosphor pattern, phosphor pattern prepared the same and back plate for plasma display panel
失效
制备荧光粉图案的方法，制备相同的荧光体图案和用于等离子体显示面板的背板
- 专利标题： Process for preparing phosphor pattern, phosphor pattern prepared the same and back plate for plasma display panel
- 专利标题（中）： 制备荧光粉图案的方法，制备相同的荧光体图案和用于等离子体显示面板的背板
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申请号： US09038286申请日： 1998-03-11
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公开(公告)号： US06194826B1公开(公告)日： 2001-02-27
- 发明人: Kazuya Satou , Hiroyuki Tanaka , Takeshi Nojiri , Naoki Kimura , Toranosuke Ashizawa , Seiji Tai , Ikuo Mukai , Seikichi Tanno
- 申请人： Kazuya Satou , Hiroyuki Tanaka , Takeshi Nojiri , Naoki Kimura , Toranosuke Ashizawa , Seiji Tai , Ikuo Mukai , Seikichi Tanno
- 优先权： JP9-056748 19970311
- 主分类号： H01J162
- IPC分类号： H01J162
摘要：
Disclosed are a process for preparing a phosphor pattern of the present invention comprises the steps of: (I) forming a phosphor-containing photosensitive resin composition layer (A) on a substrate having unevenness, (II) irradiating a scattered light to the layer (A) imagewisely, (III) developing the layer (A) by removing the portion to which the scattered light is imagewisely irradiated to form a pattern, and (IV) calcinating the formed pattern to remove an unnecessary portion from the pattern formed in the step (III) to form a phosphor pattern, a phosphor pattern produced by the above process and a back plate for the plasma display panel provided with the phosphor pattern on a substrate for a plasma display panel.
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