发明授权
US06207117B1 Charged particle beam apparatus and gas supply and exhaustion method employed in the apparatus
有权
装置中使用的带电粒子束装置和气体供给和排出方法
- 专利标题： Charged particle beam apparatus and gas supply and exhaustion method employed in the apparatus
- 专利标题（中）： 装置中使用的带电粒子束装置和气体供给和排出方法
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申请号： US09150704申请日： 1998-09-10
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公开(公告)号： US06207117B1公开(公告)日： 2001-03-27
- 发明人: Jun Takamatsu , Munehiro Ogasawara
- 申请人： Jun Takamatsu , Munehiro Ogasawara
- 优先权： JP9-253297 19970918; JP10-078931 19980326
- 主分类号： B01J2342
- IPC分类号： B01J2342
摘要：
An adsorption plate formed of a carrier and a precious metal catalyst carried by the carrier is provided at that portion of at least one of a beam column and a sample chamber incorporated in a charged-particle beam apparatus, in which carbon compounds may be generated. Further, a precious metal catalyst is provided on each deflector electrode contained in the beam column.