公开(公告)号：US06617592B2

公开(公告)日：2003-09-09

申请号：US09810478

申请日：2001-03-19

申请人： Jun Takamatsu ,  Kiyoshi Hattori ,  Hitoshi Sunaoshi ,  Naoharu Shimomura ,  Kiminobu Akeno ,  Munehiro Ogasawara

发明人： Jun Takamatsu ,  Kiyoshi Hattori ,  Hitoshi Sunaoshi ,  Naoharu Shimomura ,  Kiminobu Akeno ,  Munehiro Ogasawara

IPC分类号： A61N500

CPC分类号： H01J37/304 ,  H01J2237/20292 ,  H01J2237/3175

摘要： A charged particle beam system includes a chamber having an opening in a ceiling, a table placed immediately below the opening and movable in one direction, a laser interferometer set in the chamber, including a laser oscillator placed along the moving direction of the table, a movable mirror placed on the table side opposing the oscillator, a beam splitter placed to cross the laser beam and a fixed mirror fixed, immediately above the beam splitter, on the ceiling of the chamber, an optical lens barrel having an opening communicating with the opening of the chamber, and a beam gun set on a ceiling of the optical lens barrel to irradiate a specimen placed on the table with a charged particle beam through the first and second openings. At least an upper wall portion from the opening to the fixed mirror of the chamber is made of an invar alloy.

摘要翻译： 带电粒子束系统包括：在天花板上具有开口的腔室，放置在开口正下方并可在一个方向上移动的工作台;设置在腔室中的激光干涉仪，包括沿着工作台移动方向放置的激光振荡器， 放置在与振荡器相对的台面侧的可移动反射镜，放置成穿过激光束的分束器和在分束器正上方固定的固定镜，位于腔室的天花板上，光学透镜镜筒具有与开口连通的开口 以及设置在光学镜筒的天花板上的射束，以通过第一和第二开口照射放置在桌子上的带有带电粒子束的样本。 至少从腔室的开口到固定反射镜的上壁部分由凹入合金制成。

公开(公告)号：US06781680B1

公开(公告)日：2004-08-24

申请号：US10602701

申请日：2003-06-25

申请人： Munehiro Ogasawara ,  Jun Takamatsu ,  Hitoshi Sunaoshi ,  Naoharu Shimomura

发明人： Munehiro Ogasawara ,  Jun Takamatsu ,  Hitoshi Sunaoshi ,  Naoharu Shimomura

IPC分类号： G01J100

CPC分类号： H01J37/304 ,  H01J2237/30433 ,  H01J2237/3175

摘要： A method for adjusting an optical system of an energy beam apparatus by using a mark signal that is obtained by one-dimensionally or two-dimensionally scanning a mark on a sample with an energy beam. The mark has a one-dimensional or two-dimensional periodic structure. A first mark signal is detected by scanning the mark with a beam. The mark is set on the optical axis of the optical system. A second mark signal is detected by scanning the mark with a beam. The mark is located at a position that is deviated from the optical axis. A deviation of a deflection position is determined based on a phase difference between the first and second mark signals.

公开(公告)号：US06606149B1

公开(公告)日：2003-08-12

申请号：US09533815

申请日：2000-03-24

申请人： Munehiro Ogasawara ,  Jun Takamatsu ,  Hitoshi Sunaoshi ,  Naoharu Shimomaura

发明人： Munehiro Ogasawara ,  Jun Takamatsu ,  Hitoshi Sunaoshi ,  Naoharu Shimomaura

IPC分类号： G01J100

CPC分类号： H01J37/304 ,  H01J2237/30433 ,  H01J2237/3175

摘要： A method for adjusting an optical system of an energy beam apparatus by using a mark signal that is obtained by one-dimensionally or two-dimensionally scanning a mark on a sample with an energy beam. The mark has a one-dimensional or two-dimensional periodic structure. A first mark signal is detected by scanning the mark with a beam. The mark is set on the optical axis of the optical system. A second mark signal is detected by scanning the mark with a beam. The mark is located at a position that is deviated from the optical axis. A deviation of a deflection position is determined based on a phase difference between the first and second mark signals.

摘要翻译： 一种能量束装置的光学系统的调整方法，该方法是利用能量束对样品上的标记进行二维或二维扫描而得到的标记信号。 标记具有一维或二维周期性结构。 通过用光束扫描标记来检测第一标记信号。 标记设置在光学系统的光轴上。 通过用光束扫描标记来检测第二标记信号。 标记位于偏离光轴的位置。 基于第一和第二标记信号之间的相位差来确定偏转位置的偏差。

公开(公告)号：US06836319B2

公开(公告)日：2004-12-28

申请号：US10819201

申请日：2004-04-07

申请人： Munehiro Ogasawara ,  Jun Takamatsu ,  Hitoshi Sunaoshi ,  Naoharu Shimomura

发明人： Munehiro Ogasawara ,  Jun Takamatsu ,  Hitoshi Sunaoshi ,  Naoharu Shimomura

IPC分类号： G01J100

CPC分类号： H01J37/304 ,  H01J2237/30433 ,  H01J2237/3175

摘要： A method for adjusting an optical system of an energy beam apparatus by using a mark signal that is obtained by one-dimensionally or two-dimensionally scanning a mark on a sample with an energy beam. The mark has a one-dimensional or two-dimensional periodic structure. A first mark signal is detected by scanning the mark with a beam. The mark is set on the optical axis of the optical system. A second mark signal is detected by scanning the mark with a beam. The mark is located at a position that is deviated from the optical axis. A deviation of a deflection position is determined based on a phase difference between the first and second mark signals.

摘要翻译： 一种能量束装置的光学系统的调整方法，该方法是利用能量束对样品上的标记进行二维或二维扫描而得到的标记信号。 标记具有一维或二维周期性结构。 通过用光束扫描标记来检测第一标记信号。 标记设置在光学系统的光轴上。 通过用光束扫描标记来检测第二标记信号。 标记位于偏离光轴的位置。 基于第一和第二标记信号之间的相位差来确定偏转位置的偏差。

公开(公告)号：US06207117B1

公开(公告)日：2001-03-27

申请号：US09150704

申请日：1998-09-10

申请人： Jun Takamatsu ,  Munehiro Ogasawara

发明人： Jun Takamatsu ,  Munehiro Ogasawara

IPC分类号： B01J2342

CPC分类号： H01J37/02 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/028

摘要： An adsorption plate formed of a carrier and a precious metal catalyst carried by the carrier is provided at that portion of at least one of a beam column and a sample chamber incorporated in a charged-particle beam apparatus, in which carbon compounds may be generated. Further, a precious metal catalyst is provided on each deflector electrode contained in the beam column.

摘要翻译： 由载体承载的载体和贵金属催化剂形成的吸附板设置在可以产生碳化合物的带电粒子束装置中的梁柱和样品室中的至少一个的部分。 此外，在束柱中包含的每个偏转电极上设置贵金属催化剂。

公开(公告)号：US06172364B2

公开(公告)日：2001-01-09

申请号：US09118924

申请日：1998-07-20

申请人： Munehiro Ogasawara ,  Jun Takamatsu ,  Naoharu Shimomura ,  Shusuke Yoshitake ,  Takayuki Abe ,  Masamitsu Itoh

发明人： Munehiro Ogasawara ,  Jun Takamatsu ,  Naoharu Shimomura ,  Shusuke Yoshitake ,  Takayuki Abe ,  Masamitsu Itoh

IPC分类号： H01J3726

CPC分类号： H01J3/40 ,  H01J37/02 ,  H01J2237/0213

摘要： A reflection prevention board of a charged particle beam irradiation apparatus of the present invention comprises a laminate sheet having a plurality of thin films and a plurality of microholes through the laminate sheet. According to the present invention the reflection prevention board can be manufactured at a lower cost, the reason being that it is easier to form microholes in the thin films and then laminate these thin films in an aligned relation than to drill holes through a thicker sheet. By doing so it is possible to achieve a better yield. Further, much deeper microholes, which might not otherwise be achieved on a thick sheet, can be formed by using more thin films and a reflection prevention effect can be improved by doing so.

摘要翻译： 本发明的带电粒子束照射装置的反射防止板包括具有多个薄膜的叠层片和通过层压片的多个微孔。 根据本发明，可以以更低的成本制造防反射板，其原因是在薄膜中更容易形成微孔，然后以与排列较深的片钻孔的排列关系层叠这些薄膜。 通过这样做，可以实现更好的产量。 此外，可以通过使用更多的薄膜来形成在厚片材上可能不能实现的更深的微孔，并且通过这样做可以改善防反射效果。

公开(公告)号：US5949076A

公开(公告)日：1999-09-07

申请号：US804672

申请日：1997-02-25

申请人： Kenji Ohtoshi ,  Munehiro Ogasawara ,  Jun Takamatsu ,  Toru Koike ,  Kazuyoshi Sugihara

发明人： Kenji Ohtoshi ,  Munehiro Ogasawara ,  Jun Takamatsu ,  Toru Koike ,  Kazuyoshi Sugihara

IPC分类号： H01J37/02 ,  H01J37/147 ,  H01J49/22

CPC分类号： H01J37/02 ,  H01J37/1477 ,  H01J2237/022

摘要： A charged beam applying apparatus comprises a column at least having a charged beam generation section and optical system for controlling the charged beam and a chamber for holding a specimen in place which is exposed with the charged beam. At least one inner portion of the column is formed of a specific material whose an atomic number is equal or less than 22. When a contamination is cleaned off in the column through the utilization of an oxidation effect, an oxide film is sometimes formed inside the column. The electric charging of the oxide film causes a beam control error. The specific material such as the metal of the atomic number causes very much less such error. This is because such specific material involves less emission of secondary electrons and less electric charging in the oxide film formed.

摘要翻译： 带电波束施加装置包括至少具有带电波束产生部分和用于控制带电波束的光学系统的柱和用于将样本保持在用充电束暴露的适当位置的室。 柱的至少一个内部部分由原子序数等于或小于22的特定材料形成。当通过利用氧化效应在柱中清除污染物时，有时会在其内部形成氧化物膜 柱。 氧化膜的充电引起光束控制误差。 诸如原子序号的金属的具体材料导致非常少的这种误差。 这是因为这种具体材料在形成的氧化膜中涉及较少的二次电子的发射和较少的电荷。

公开(公告)号：US5539211A

公开(公告)日：1996-07-23

申请号：US365825

申请日：1994-12-29

申请人： Kenji Ohtoshi ,  Itsuko Sakai ,  Yuichiro Yamazaki ,  Jun Takamatsu ,  Munehiro Ogasawara ,  Kazuyoshi Sugihara

发明人： Kenji Ohtoshi ,  Itsuko Sakai ,  Yuichiro Yamazaki ,  Jun Takamatsu ,  Munehiro Ogasawara ,  Kazuyoshi Sugihara

IPC分类号： H01J37/18 ,  B08B7/00 ,  H01J37/30 ,  H01L21/027

CPC分类号： H01J37/32862 ,  B08B7/0035 ,  G03F7/70925 ,  H01J37/3002 ,  H01J2237/022

摘要： A charged beam apparatus comprises a source tank provided outside the column and containing a plasma source, a plasma generating apparatus for generating plasma from a plasma source supplied from the source tank, gate valves and an exhausting pump for introducing plasma generated by the plasma generating apparatus into the column and for exhausting the plasma therefrom, and an O-ring for restricting a passage of plasma in the column such that those portions of cleaning portions to be cleaned to which internal contaminants stick are mainly exposed to plasma. Therefore, it is possible to generation of an oxide film, a fluoride film, or the likes which cause drifting can be restricted.

摘要翻译： 带电波束装置包括：设置在该列外部并包含等离子体源的源极槽，用于从源极箱提供的等离子体源产生等离子体的等离子体产生装置，闸阀和用于引入由等离子体产生装置产生的等离子体的排气泵 并且用于排出等离子体的O形环和用于限制柱中等离子体通过的O形环，使得内部污染物粘附的待清洁的清洁部分的那些部分主要暴露于等离子体。 因此，可以限制产生漂移的氧化膜，氟化物膜等。

公开(公告)号：US08586951B2

公开(公告)日：2013-11-19

申请号：US13597772

申请日：2012-08-29

申请人： Ryoichi Yoshikawa ,  Munehiro Ogasawara

发明人： Ryoichi Yoshikawa ,  Munehiro Ogasawara

IPC分类号： H01J37/305

CPC分类号： H01J37/305 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3177 ,  H01J2237/31761

摘要： In accordance with one aspect of this invention, a multi charged particle beam writing apparatus includes an aperture member, in which a plurality of openings are formed, configured to form multi-beams by making portions of the charged particle beam pass through the plurality of openings; a writing processing control unit configured to control writing processing so that a plurality of beams having passed through different openings among the plurality of openings are arranged to align on the target object; and a shot interval adjusting unit configured to adjust shot intervals among beams so that a maximum shot interval among beams being a control grid interval defined by a predetermined quantization size or a size which is prescribed within a predetermined range from the predetermined quantization size, or less when the shot intervals among beams which are arranged to align on the target object are different depending on a place.

摘要翻译： 根据本发明的一个方面，一种多带电粒子束写入装置，包括：孔部件，其中形成有多个开口，构成为通过使带电粒子束的部分通过多个开口而形成多光束; ; 写入处理控制单元，被配置为控制写入处理，使得已经穿过多个开口中的不同开口的多个光束被布置成在目标对象上对准; 以及拍摄间隔调整单元，被配置为调整光束之间的拍摄间隔，使得作为由预定量化尺寸定义的控制网格间隔或者在从预定量化尺寸或更小的预定范围内规定的尺寸的光束之间的最大拍摄间隔 当在目标对象上排列成对准的光束之间的拍摄间隔根据位置而不同时。

公开(公告)号：US6028317A

公开(公告)日：2000-02-22

申请号：US5640

申请日：1998-01-12

申请人： Ken-ichi Murooka ,  Munehiro Ogasawara ,  Hitoshi Sunaoshi

发明人： Ken-ichi Murooka ,  Munehiro Ogasawara ,  Hitoshi Sunaoshi

IPC分类号： G21K1/087 ,  G21K1/093 ,  H01J3/18 ,  H01J37/12 ,  H01J37/14 ,  H01J37/305 ,  H01L21/027 ,  G21K1/08 ,  H01J3/14

CPC分类号： H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  G21K1/087 ,  H01J3/18 ,  H01J37/12 ,  H01J2237/121 ,  H01J2237/151 ,  H01J2237/153 ,  H01J2237/3175

摘要： An optical element includes two electrodes 1 and 2 arranged at a distance to oppose each other and configured to converge an electron beam. The opposing surfaces of the electrodes 1 and 2 are so formed as to be cylindrically symmetrical along the beam passing direction and to form curves obtained by deforming hyperbolas in a direction perpendicular to the beam passing direction, in order that an electric field whose effective part except for an arbitrary constant of the field potential is given by.phi.=(k/2)r.sup.2 -.alpha.lnr-kz.sup.2is spatially partially formed in a cylindrical coordinate system defined by (r, z, .theta.).

摘要翻译： 光学元件包括两个彼此相对配置的距离并配置成会聚电子束的电极1和2。 电极1和2的相对表面被形成为沿着光束通过方向为圆柱对称，并且形成通过使垂直于光束通过方向的方向使双曲线变形而获得的曲线，以便将有效部分除外 对于场电位的任意常数由phi =（k / 2）给出，r2-α1nr-kz2在空间上部分地形成在由（r，z，θ）定义的圆柱坐标系中。