发明授权
- 专利标题: Ion implanter
- 专利标题(中): 离子注入机
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申请号: US09294995申请日: 1999-04-20
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公开(公告)号: US06207959B1公开(公告)日: 2001-03-27
- 发明人: Shu Satoh , Theodore H. Smick
- 申请人: Shu Satoh , Theodore H. Smick
- 主分类号: H01J3700
- IPC分类号: H01J3700
摘要:
An ion implanter for sequentially processing single semiconductor wafers includes a scanning arm extending along a first axis. A wafer holder is mounted on a free end of the arm so as to be rotatable about a second axis centered on and perpendicular to the plane of the wafer. The wafer can be scanned through an ion beam by reciprocating the arm transversely of the first axis. A rotary motor is mounted in the scanning arm near the free end with its axis of rotation parallel to the first axis and perpendicular to the second axis. A right angle rotary drive connects the motor to the wafer holder. A hard stop is provided on the motor to prevent the wafer from being rotated by more than 360°. Connections to the wafer on the holder are provided by a flexible circuit coiled about the second axis. The scanning mechanism can itself be rotated about an axis parallel to the arm so as to tilt the scanning direction, the wafer holder is itself further rotatable about the arm axis relative to the scanning mechanism. This enables the wafer to be rotated to the horizontal when the mechanical scanning mechanism holds the arm with the wafer above the beam.
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