公开(公告)号：US06758312B2

公开(公告)日：2004-07-06

申请号：US10131297

申请日：2002-04-23

Applicant: Peter Heiland

Inventor： Peter Heiland

IPC: H01J3700

CPC classification number: F16F15/005 ,  F16F15/08

Abstract: An active system for isolating vibrations includes: at least one first vibratio-isolating device, arranged between a load and a sstanding surface, for at least partially decoupling the static and dynamic forces acting between the load and the standing surface, the first vibration-isolating device includes a passively isolating coupling element for mechanically decoupling the static and dynamic forces including a natural frequency; at least one second vibration-isolating device, assigned to the load, for imparting control forces to the load for actively damping the substantially decoupled dynamic forces, the second fibratio-isolating device including a coupling element for dynamically coupling said second vibration-isolating device to the load and the first isolating device

Abstract translation: 用于隔离振动的主动系统包括：至少一个第一振动隔离装置，布置在负载和听表面之间，用于至少部分地解耦作用在负载和站立表面之间的静态和动态力，第一隔振 装置包括用于机械地去耦合包括固有频率的静态力和动态力的被动隔离耦合元件; 分配给所述负载的至少一个第二隔振装置，用于向所述负载施加控制力以主动地阻尼所述基本上分离的动态力，所述第二纤维隔离装置包括用于将所述第二隔振装置动态地联接到 负载和第一隔离装置<耦合元件包括固有频率; 用于调节第二振动隔离装置的控制力和固有频率的装置，其中第二隔振装置的控制力和固有频率通过特性曲线来确定，该特性曲线描述了控制力对 被动隔离耦合元件的固有频率和固有频率的比值。

公开(公告)号：US06661005B1

公开(公告)日：2003-12-09

申请号：US09830998

申请日：2001-05-01

Applicant: Wilhelm Bruenger

Inventor： Wilhelm Bruenger

IPC: H01J3700

CPC classification number: H01J37/026 ,  H01J37/3056 ,  H01J2237/0044 ,  H01J2237/2002 ,  H01J2237/2608

Abstract: In a method of examining the surface structures of a sample or of modifying the surface structures of a sample by means of a beam impinging on the surface structure of the sample, gas is supplied discontinuously, preferably in a pulsed mode, at least in the area of impingement of the beam on the surface structure of the sample.

Abstract translation: 在检查样品的表面结构或通过撞击样品的表面结构的光束来改变样品的表面结构的方法中，至少在区域中优选以脉冲模式供应气体， 光束在样品的表面结构上的撞击。

公开(公告)号：US06627890B2

公开(公告)日：2003-09-30

申请号：US09535030

申请日：2000-03-24

Applicant: Stefan Lanio

Inventor： Stefan Lanio

IPC: H01J3700

CPC classification number: H01J37/26 ,  H01J37/153 ,  H01J2237/1506

Abstract: A particle beam apparatus for tilted observation of a specimen is capable of producing magnification images of the specimen under tilted observation with high accuracy. The particle beam apparatus includes a source for generating a particle beam, deflection means for tilting the particle beam and a lens for focussing the tilted particle beam onto the specimen. Furthermore, multipole correction means are provided for correcting the lens aberrations occurring due to off-axial intersection of the lens by the tilted particle beam. The lens is an electrostatic, magnetic or combined electrostatic-magnetic objective lens.

Abstract translation: 用于倾斜观察样品的粒子束装置能够以高精度在倾斜观察下产生样本的放大图像。 粒子束装置包括用于产生粒子束的源，用于使粒子束倾斜的偏转装置和用于将倾斜的粒子束聚焦到样本上的透镜。 此外，提供多极校正装置，用于校正由于倾斜的粒子束而导致的透镜的非轴向交叉产生的透镜像差。 透镜是静电，磁性或组合静电磁物镜。

公开(公告)号：US06603128B2

公开(公告)日：2003-08-05

申请号：US09842120

申请日：2001-04-26

Applicant: Hiroshi Maehara ,  Haruhito Ono ,  Yasuhiro Shimada ,  Takayuki Yagi

Inventor： Hiroshi Maehara ,  Haruhito Ono ,  Yasuhiro Shimada ,  Takayuki Yagi

IPC: H01J3700

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/301 ,  H01J37/3174

Abstract: A correction electron optical system (3) has substrates in which apertures for constituting electron lenses are formed. Valves (14) whose opening degrees can be adjusted are used to relax the pressure difference between the upper and lower surfaces of each substrate caused when supply/exhaust pumps (51-56) adjust the internal pressure of a main body cover (80). The opening degrees are controlled based on outputs from differential pressure sensors (13). The pressure sensors (13) can be replaced with photosensors.

公开(公告)号：US06573501B2

公开(公告)日：2003-06-03

申请号：US09789484

申请日：2001-02-20

Applicant: Toshikatsu Kaneyama ,  Hiromi Nunome ,  Masaki Takeguchi

Inventor： Toshikatsu Kaneyama ,  Hiromi Nunome ,  Masaki Takeguchi

IPC: H01J3700

CPC classification number: H01J37/26 ,  H01J2237/1514 ,  H01J2237/2614

Abstract: A holography electron microscope permitting electron holography without limitations on the magnification. An electron biprism is mounted between a system of intermediate lenses and a system of projector lenses. The objective lens and the system of intermediate lenses form a crossover at a given position between intermediate lenses and the electron biprism and, at the same time, focus a magnified image at a certain position between the electron biprism and projector lenses. Since the system of intermediate lenses is made up of three or more stages of lenses, it forms a crossover at a given position and focuses a magnified image at a certain position.

Abstract translation: 全息电子显微镜，允许电子全息术，但不限于放大倍率。 电子双棱镜安装在中间透镜系统和投影仪透镜系统之间。 物镜和中间透镜系统在中间透镜和电子双棱镜之间的给定位置处形成交叉，并且同时将放大图像聚焦在电子双棱镜和投影透镜之间的特定位置。 由于中间透镜系统由三个或更多个镜头组成，因此在给定位置形成一个交叉，并将放大的图像聚焦在某个位置。

公开(公告)号：US06566666B2

公开(公告)日：2003-05-20

申请号：US10230315

申请日：2002-08-29

Applicant: In-Kyeong Yoo

Inventor： In-Kyeong Yoo

IPC: H01J3700

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3175 ,  H01J2237/31777

Abstract: A method and an apparatus for pyroelectric lithography using a patterned emitter is provided. In the apparatus for pyroelectric lithography, a pyroelectric emitter or a ferroelectric emitter is patterned using a mask and it is then heated. Upon heating, electrons are not emitted from that part of the emitter covered by the mask, but are emitted from the exposed part of the emitter not covered by the mask so that the shape of the emitter pattern is projected onto the substrate. To prevent dispersion of emitted electron beams, which are desired to be parallel, the electron beams are controlled using a magnet or a projection system, thereby achieving exact a one-to-one projection or a x-to-one projection of the desired pattern etched on the substrate.

Abstract translation: 提供了一种使用图案化发射器进行热电光刻的方法和装置。 在用于热电光刻的装置中，使用掩模对热电发射体或铁电发射体进行图案化，然后将其加热。 在加热时，电子不会从掩模覆盖的发射体的那部分发射，而是从未被掩模覆盖的发射体的暴露部分发射，使得发射极图案的形状投影到基板上。 为了防止希望平行的发射电子束的分散，使用磁体或投影系统控制电子束，从而精确地实现所需图案的一对一投影或一对一投影 蚀刻在基板上。

公开(公告)号：US06555825B1

公开(公告)日：2003-04-29

申请号：US09552697

申请日：2000-04-19

Applicant: Robert John Clifford Mitchell ,  Keith Relleen ,  Justin Lowe

Inventor： Robert John Clifford Mitchell ,  Keith Relleen ,  Justin Lowe

IPC: H01J3700

CPC classification number: H01J37/3171 ,  H01J2237/20228

Abstract: An ion implanter having a scanning arm which can pass vertically through ion beam, having a wafer loading/unloading position above the beam. The scanning arm also has capability for movement of wafer in its own plane when tilted relative to the beam, and there is also disclosure of a double scanning arm arrangement generating to/from a single wafer loader/unloader.

Abstract translation: 具有扫描臂的离子注入机可以垂直地穿过离子束，在光束上方具有晶片装载/卸载位置。 当相对于光束倾斜时，扫描臂还具有在其自身平面中移动晶片的能力，并且还公开了向/从单个晶片加载器/卸载器产生的双扫描臂布置。

公开(公告)号：US06486471B1

公开(公告)日：2002-11-26

申请号：US09313116

申请日：1999-05-17

Applicant: Masamichi Oi

Inventor： Masamichi Oi

IPC: H01J3700

CPC classification number: H01J37/30 ,  H01J37/09 ,  H01J2237/0203

Abstract: A charged particle beam apparatus has a plurality of charged particle beam generating systems disposed in a chamber and a neutralizing coil for neutralizing a first charged particle beam generating system to control the magnetic field in the path of a charged particle beam generated by a second charged particle beam system. The first charged particle beam generating system comprises one or more electron beam lens barrels, and the second charged particle beam generating system comprises one or more focused ion beam lens barrels. The neutralizing coil controls an excitation current of the objective lens of a first electron beam lens barrel.

Abstract translation: 带电粒子束装置具有设置在腔室中的多个带电粒子束产生系统和用于中和第一带电粒子束产生系统的中和线圈，以控制由第二带电粒子产生的带电粒子束的路径中的磁场 梁系统。 第一带电粒子束产生系统包括一个或多个电子束透镜筒，第二带电粒子束产生系统包括一个或多个聚焦离子束透镜筒。 中和线圈控制第一电子束透镜筒的物镜的激励电流。

公开(公告)号：US06448553B1

公开(公告)日：2002-09-10

申请号：US09558296

申请日：2000-04-25

Applicant: Takeaki Itsuji ,  Shunichi Shido

Inventor： Takeaki Itsuji ,  Shunichi Shido

IPC: H01J3700

CPC classification number: G01Q60/38 ,  G01Q20/04 ,  G01Q40/00 ,  Y10S977/85 ,  Y10S977/872 ,  Y10S977/873

Abstract: A scanning probe having a piezo resistance cantilever section is used with a signal detector comprising a signal detection circuit for detecting a change in the piezo resistance and a circuit for removing an offset component from the signal. Such a scanning probe is used for a scanning probe microscope, in particular an atomic force microscope to obtain a high resolution surface image.

Abstract translation: 具有压电电阻悬臂部分的扫描探针与包括用于检测压电电阻变化的信号检测电路的信号检测器和用于从信号中去除偏移分量的电路一起使用。 这种扫描探针用于扫描探针显微镜，特别是原子力显微镜以获得高分辨率的表面图像。

公开(公告)号：US06396054B1

公开(公告)日：2002-05-28

申请号：US09659549

申请日：2000-09-11

Applicant: Vic B. Kley

Inventor： Vic B. Kley

IPC: H01J3700

CPC classification number: G03F7/70616 ,  G01Q30/02 ,  G01Q60/02 ,  G01Q60/16 ,  G01Q60/22 ,  G02B21/002 ,  G03F1/84 ,  G03F7/704 ,  G11B5/232 ,  G11B5/3116 ,  Y10S977/85 ,  Y10S977/852

Abstract: A scanning probe microscope assembly and corresponding method for making confocal, spectrophotometric, near-field, and scanning probe measurements and forming associated images from the measurements.

Abstract translation: 一种扫描探针显微镜组件及相应的方法，用于进行共聚焦，分光光度，近场和扫描探针测量，并从测量中形成相关图像。