发明授权
US06211947B1 Illuminance distribution measuring method, exposing method and device manufacturing method 失效
照度分布测量方法,曝光方法和器件制造方法

  • 专利标题: Illuminance distribution measuring method, exposing method and device manufacturing method
  • 专利标题(中): 照度分布测量方法,曝光方法和器件制造方法
  • 申请号: US09212101
    申请日: 1998-12-15
  • 公开(公告)号: US06211947B1
    公开(公告)日: 2001-04-03
  • 发明人: Toshihiko Tsuji
  • 申请人: Toshihiko Tsuji
  • 优先权: JP9-363543 19971215; JP10-351106 19981210
  • 主分类号: G03B2774
  • IPC分类号: G03B2774
Illuminance distribution measuring method, exposing method and device manufacturing method
摘要:
A method of measuring an illuminance distribution on a substrate; which is characterized in that the method comprises a step of reciprocatively moving a detecting sensor positioned on a substrate stage along a route during which the detecting sensor is intermittently stopped at a plurality of locations within an exposure region over the substrate, and, after reaching a turning location, moved to return along the route during which the detecting sensor is intermittently stopped again at these locations; in that measurement of illuminance is performed an even number of times at each location; and in that the illuminance distribution in the exposure region over the substrate is determined based not only on a measured value of illuminance obtained at each location during the forward movement of the detecting sensor but also on a measured value of illuminance obtained at each location during the returning movement of the detecting sensor.
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