公开(公告)号：US06459472B1

公开(公告)日：2002-10-01

申请号：US09302850

申请日：1999-04-30

申请人： Pieter Willem Herman De Jager ,  Henri Gerard Cato Werij ,  Peter Van Zuylen

发明人： Pieter Willem Herman De Jager ,  Henri Gerard Cato Werij ,  Peter Van Zuylen

IPC分类号： G03B2774

CPC分类号： G03F7/70933 ,  G03F7/70233 ,  G03F7/70358 ,  G03F7/70866 ,  G03F7/70916

摘要： A lithographic device has a radiation system for supplying a projection beam of radiation; a mask table provided with a mask holder for holding a mask; a substrate table provided with a substrate holder for holding a substrate; and a projection system for imaging an irradiated portion of the mask onto a target portion of the substrate. The projection system is separated from the table by an intervening space which can be at least partially evacuated and which is delimited at the location of the projection system by a mirror from which the employed radiation is directed toward the substrate table. The intervening space contains a hollow tube located between the solid surface and the substrate table and situated around the path of radiation, the form and size of the tube being such that radiation focused by the de Jager et al. projection system onto the substrate table does not intercept a wall of the hollow tube. A gas flushing unit is provided for continually flushing the inside of the hollow tube with a flow of gas.

摘要翻译： 平版印刷设备具有用于提供投影射线束的辐射系统; 设置有用于保持面罩的面罩座的面罩台; 设置有用于保持基板的基板保持器的基板台; 以及用于将掩模的照射部分成像到基板的目标部分上的投影系统。 投影系统通过一个可以至少部分抽真空的中间空间与桌子分开，并且通过反射镜在投影系统的位置处被界定，所用的辐射从该反射镜引导到基板台。 中间空间包含位于固体表面和基板台之间的中空管，并且位于辐射路径周围，管的形状和尺寸使得由de Jager等人聚焦的辐射 投影系统不会拦截中空管的壁。 提供一种气体冲洗单元，用于以气流连续冲洗中空管的内部。

公开(公告)号：US06211947B1

公开(公告)日：2001-04-03

申请号：US09212101

申请日：1998-12-15

申请人： Toshihiko Tsuji

发明人： Toshihiko Tsuji

IPC分类号： G03B2774

CPC分类号： G03F7/70058 ,  G03B27/74

摘要： A method of measuring an illuminance distribution on a substrate; which is characterized in that the method comprises a step of reciprocatively moving a detecting sensor positioned on a substrate stage along a route during which the detecting sensor is intermittently stopped at a plurality of locations within an exposure region over the substrate, and, after reaching a turning location, moved to return along the route during which the detecting sensor is intermittently stopped again at these locations; in that measurement of illuminance is performed an even number of times at each location; and in that the illuminance distribution in the exposure region over the substrate is determined based not only on a measured value of illuminance obtained at each location during the forward movement of the detecting sensor but also on a measured value of illuminance obtained at each location during the returning movement of the detecting sensor.

摘要翻译： 一种测量衬底上的照度分布的方法; 其特征在于，所述方法包括：沿着所述检测传感器在所述基板上的曝光区域内的多个位置间歇地停止的路径往复移动位于基板台上的检测传感器的步骤，并且在达到 转动位置，沿着路线返回，在该路线期间，检测传感器在这些位置处再次间歇地停止; 在每个位置进行照度测量偶数次; 并且基于不仅基于在检测传感器的向前移动期间在每个位置处获得的照度的测量值，而且基于在检测传感器的向前移动期间获得的照度的测量值来确定衬底上的曝光区域中的照度分布 返回检测传感器的运动。

公开(公告)号：US06400444B2

公开(公告)日：2002-06-04

申请号：US09005003

申请日：1998-01-09

申请人： Takehiko Suzuki

发明人： Takehiko Suzuki

IPC分类号： G03B2774

CPC分类号： G03F7/70016 ,  G03F7/70058 ,  G03F7/7055 ,  H01J61/822 ,  H05B41/3922

摘要： An apparatus for exposing a wafer to ultraviolet light with a constant intensity emitted from a super-high pressure mercury lamp along an exposure beam path. A shutter opens and closes the exposure beam path. When the mercury lamp cannot be turned off during non-exposure, the mercury lamp is driven to maintain the intensity of the ultraviolet light constant when the shutter is open, and the mercury lamp is driven to maintain current, voltage or power for driving the mercury lamp constant when the shutter is closed, thereby decreasing deterioration in the mercury lamp.

摘要翻译： 一种用于将晶片暴露于具有恒定强度的紫外光的装置，该紫外光沿着曝光光路从超高压汞灯发射。 快门打开和关闭曝光光束路径。 当非曝光时水银灯不能关闭时，驱动水银灯，以便在快门打开时保持紫外线的强度恒定，并且水银灯被驱动以维持用于驱动汞的电流，电压或功率 当快门关闭时，灯恒定，从而降低汞灯的劣化。

公开(公告)号：US06222615B1

公开(公告)日：2001-04-24

申请号：US09203348

申请日：1998-12-02

申请人： Kazuaki Suzuki

发明人： Kazuaki Suzuki

IPC分类号： G03B2774

CPC分类号： G03F7/70058 ,  G03F7/70091 ,  G03F7/70358 ,  G03F7/70558 ,  G03F7/70566 ,  G03F7/70583

摘要： An apparatus has a pulse light source for emitting light pulses with varying light quantities, an illumination optical system for radiating the light pulses from the source onto a predetermined illumination region on a mask on which a transfer pattern is formed, and a projection optical system for projecting an image of the pattern onto a predetermined exposure region on a substrate, and which synchronously scans the mask and the substrate during the projection. The apparatus includes a measuring device for detecting intensities of the light pulses radiated onto the substrate during the scanning and measuring an integrated light quantity on each of a plurality of partial regions in the exposure region on the substrate on the basis of a detection signal of the intensities, wherein the partial regions are defined by a scanning speed of the photosensitive substrate and an oscillation interval of the light pulses. The apparatus further includes an adjusting device for adjusting an intensity of the next light pulse to be radiated onto the mask on the basis of a difference between a target integrated light quantity and the measured integrated light quantity on each of the partial regions when some light pulses are radiated onto the mask.

公开(公告)号：US06717652B2

公开(公告)日：2004-04-06

申请号：US09820841

申请日：2001-03-30

申请人： Toshifumi Suganaga

发明人： Toshifumi Suganaga

IPC分类号： G03B2774

CPC分类号： G03F7/70558

摘要： An exposure apparatus and an exposure method according to the present invention comprise an average illuminance operation unit for averaging illuminance values obtained from four illuminance meters provided on a stage and obtaining average illuminance and a light exposure control unit controlling a light exposure on the basis of information obtained from the average illuminance operation unit. Thus, an exposure apparatus and an exposure method capable of correctly managing the light exposure can be provided.

摘要翻译： 根据本发明的曝光装置和曝光方法包括：平均照度操作单元，用于平均从设置在舞台上的四个照度计获得的照度值，并获得平均照度，以及基于信息控制曝光的曝光控制单元 从平均照度操作单元获得。 因此，可以提供能够正确地管理曝光的曝光装置和曝光方法。

公开(公告)号：US06612730B1

公开(公告)日：2003-09-02

申请号：US09713613

申请日：2000-11-15

申请人： Makoto Ikeda

发明人： Makoto Ikeda

IPC分类号： G03B2774

CPC分类号： H04N1/02835 ,  G03G15/04036 ,  G03G15/0435 ,  H04N1/02885 ,  H04N1/0315 ,  H04N1/0318 ,  H04N2201/03112 ,  H04N2201/03133 ,  H04N2201/03141 ,  H04N2201/03145

摘要： A light scattering pattern is disposed near the focus of a curved surface regarded as a concave mirror. Scattered light reflected by the curved surface and emitted from a planar surface is focused at a predetermined focused position. If the predetermined focused position and an image surface to be read are aligned with each other, then the scattered light from the light scattering pattern falls fully on the image surface without being wasted, so that a spatial light intensity distribution in an auxiliary scanning direction is uniformized.

摘要翻译： 光散射图案设置在被认为是凹面镜的曲面的焦点附近。 由曲面反射并从平面发射的散射光聚焦在预定的聚焦位置。 如果预定的聚焦位置和待读取的图像表面彼此对准，则来自光散射图案的散射光完全落在图像表面上而不被浪费，使得辅助扫描方向上的空间光强度分布为 均匀化

公开(公告)号：US06333780B1

公开(公告)日：2001-12-25

申请号：US09598331

申请日：2000-06-21

申请人： Eiji Tsukuda

发明人： Eiji Tsukuda

IPC分类号： G03B2774

CPC分类号： G03F7/70125 ,  G02B27/46 ,  G02F1/1347 ,  G03F7/70308

摘要： The pattern of a spatial frequency filter including a liquid crystal element (1031-103n) is controlled without removing the filter from a projection lens system. Specifically, a spatial frequency filter (103) is disposed at the pupil surface in a projection lens system (10). A means for controlling the spatial frequency filter (103) includes a liquid crystal element controller (15b) and a filter information storage (16b). A pattern required for the spatial frequency filter (103) is transferred from the filter information storage (16b) to the liquid crystal controller (15b). The transmittance and phase shift of the spatial frequency filter (103) are previously designed by simulation, for example. Based on these data, an aspect of applying a voltage to the liquid crystal element (1031-103n) is stored in the filter information storage (16b).

摘要翻译： 控制包括液晶元件（1031-103n）的空间频率滤波器的图案，而不从投影透镜系统移除滤光器。 具体地说，在投影透镜系统（10）中的瞳孔表面设置空间频率滤波器（103）。 用于控制空间频率滤波器（103）的装置包括液晶元件控制器（15b）和滤波器信息存储器（16b）。 空间频率滤波器（103）所需的模式从滤波器信息存储器（16b）传送到液晶控制器（15b）。 例如，空间频率滤波器（103）的透射率和相移预先通过模拟来设计。 基于这些数据，向滤波器信息存储部（16b）中存储向液晶元件（1031-103n）施加电压的一个方面。

公开(公告)号：US06333779B1

公开(公告)日：2001-12-25

申请号：US09467982

申请日：1999-12-21

申请人： Masami Tabata ,  Tatsundo Kawai

发明人： Masami Tabata ,  Tatsundo Kawai

IPC分类号： G03B2774

CPC分类号： H04N1/02885 ,  G02B6/00 ,  H04N1/02815 ,  H04N1/02835 ,  H04N1/0284 ,  H04N1/0315 ,  H04N1/0318 ,  H04N1/1017 ,  H04N1/193 ,  H04N1/484 ,  H04N2201/03112 ,  H04N2201/0312 ,  H04N2201/03125 ,  H04N2201/03141 ,  H04N2201/03145 ,  H04N2201/0317 ,  H04N2201/03187 ,  H04N2201/03195

摘要： There is disclosed a light guide for guiding light from a light source in a longitudinal direction and radiating the light to illuminate an object to be illuminated, which comprises a diffuser for diffusing the light from the light source along the longitudinal direction of the light guide, and a radiator for radiating the light diffused by the diffuser in a predetermined direction. By arranging the diffuser and the radiator so that a normal line passing through the center of the width of the diffuser is different from the predetermined direction at least in the vicinity of the light source when viewed in the longitudinal direction of the light guide, the illuminance distribution of the longitudinal direction of the light guide is uniformed.

摘要翻译： 公开了一种用于沿纵向引导来自光源的光的光导，并且照射被照明物体的光，该光源包括用于沿着光导的纵向漫射来自光源的光的扩散器， 以及散热器，用于沿预定方向辐射由扩散器扩散的光。 通过设置漫射器和散热器，使得当从导光体的纵向方向观察时，至少在光源附近通过扩散器的宽度的中心的法线不同于预定方向，照度 光导的纵向分布均匀。