发明授权
- 专利标题： Gas supply apparatus and film forming apparatus
- 专利标题（中）： 供气装置和成膜装置
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申请号： US09451911申请日： 1999-12-01
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公开(公告)号： US06224676B1公开(公告)日： 2001-05-01
- 发明人: Katsunori Nakajima , Hiroyuki Shida , Eiji Setoyama , Koji Ishiguro , Hikaru Saruta
- 申请人： Katsunori Nakajima , Hiroyuki Shida , Eiji Setoyama , Koji Ishiguro , Hikaru Saruta
- 优先权： JP10-342922 19981202
- 主分类号： C23C1600
- IPC分类号： C23C1600
摘要：
According to the present invention, a signal transmission system is arranged in a region surrounded by a gas control means and a plurality of blocks whereby a region between elements constituting a gas supply flow path can be utilized for the region of the signal transmission system thereby to make the occupying space small and miniaturize the apparatus.
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