公开(公告)号：US06084356A

公开(公告)日：2000-07-04

申请号：US84911

申请日：1998-05-28

Applicant: Hirofumi Seki ,  Satoshi Ichimura ,  Satoshi Takemori ,  Eiji Setoyama ,  Kouji Ishiguro ,  Yasuhiro Mochizuki ,  Sensuke Okada ,  Hajime Murakami

Inventor： Hirofumi Seki ,  Satoshi Ichimura ,  Satoshi Takemori ,  Eiji Setoyama ,  Kouji Ishiguro ,  Yasuhiro Mochizuki ,  Sensuke Okada ,  Hajime Murakami

IPC: H05H1/46 ,  C23C16/50 ,  C23C16/511 ,  C23F4/00 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/31

CPC classification number: H01J37/32229 ,  H01J37/32192 ,  H01J37/32266 ,  H01J37/32678

Abstract: Dielectric bodies are arranged in waveguide portions for passing microwave radiation and for holding a plasma generating chamber 25 at a vacuum. The dielectric bodies are arranged to intersect at least an electron cyclotron resonance area of the waveguide portions. A tip end portion of the dielectric bodies at a side of the plasma generating chamber are positioned toward at a side of the plasma generating chamber from an intermediate portion in an axial direction length of a first permanent magnet which is arranged by enclosing an outer periphery of the waveguide portions, and a tip end portion of the dielectric bodies at a side of the plasma generating chamber is substantially consistent with an inner face of the plasma generating chamber.

Abstract translation: 电介质体布置在用于通过微波辐射的波导部分中并且用于将等离子体产生室25保持在真空下。 电介质体被布置成与波导部分的至少一个电子回旋共振区域相交。 等离子体发生室一侧的电介质体的前端部从第一永久磁铁的轴向方向长度的中间部朝向等离子体发生室侧， 波导部分和等离子体发生室侧面的电介质体的末端部分与等离子体发生室的内表面基本一致。

公开(公告)号：US4865709A

公开(公告)日：1989-09-12

申请号：US207537

申请日：1988-06-16

Applicant: Yukio Nakagawa ,  Ken-ichi Natsui ,  Youichi Ohshita ,  Tadashi Sato ,  Eiji Setoyama ,  Mitsuhiro Kamei

Inventor： Yukio Nakagawa ,  Ken-ichi Natsui ,  Youichi Ohshita ,  Tadashi Sato ,  Eiji Setoyama ,  Mitsuhiro Kamei

IPC: C23C14/35 ,  H01J37/34

CPC classification number: H01J37/3423 ,  C23C14/35 ,  H01J37/3408 ,  H01J37/347

Abstract: A magnetron sputter apparatus according to the present invention is constructed so as to satisfy a predetermined optimum relationship between the size of the erosion area on the surface of the target and that of a film forming region. Further, the distance between the target and substrates has a value predetermined for the relationship between the size of the erosion area on the surface of the target and that of the film forming region. By using the magnetron sputter apparatus according to the present invention it is possible to form a homogeneous thin film excellent in step coverage and having a film thickness distribution in which variations are small over a large area.

Abstract translation: 根据本发明的磁控溅射装置被构造成满足目标表面上的侵蚀区域的大小与成膜区域的预定最佳关系。 此外，靶和基板之间的距离具有对于靶的表面上的侵蚀区域的尺寸与成膜区域的尺寸之间的关系预定的值。 通过使用根据本发明的磁控溅射装置，可以形成具有优异的台阶覆盖率并且具有在大面积上变化小的膜厚度分布的均匀薄膜。

公开(公告)号：US4673482A

公开(公告)日：1987-06-16

申请号：US911421

申请日：1986-09-25

Applicant: Eiji Setoyama ,  Keiji Arimatsu ,  Youichi Ohshita

Inventor： Eiji Setoyama ,  Keiji Arimatsu ,  Youichi Ohshita

IPC: C23C14/36 ,  C23C14/34 ,  C23C14/35 ,  H01F41/18 ,  H01J37/34 ,  C23C14/00

CPC classification number: C23C14/351 ,  H01J37/3402

Abstract: A sputtering apparatus for sputtering magnetic materials. The apparatus comprises at least one pair of magnetic field-generating sources, a substrate disposed within the magnetic field-generating sources, a target disposed opposite to the substrate, and a magnetic thin plate disposed at a side of the substrate which is remote from the target. The magnetic thin plate is disposed at a position in close contact with the substrate or a position slightly away from the substrate, or is disposed movably between such positions. When sputtering a magnetic material onto the substrate, a uniform magnetic field can be generated on the substrate surface by virtue of the provision of the thin magnetic plate.

Abstract translation: 溅射磁性材料的溅射装置。 该装置包括至少一对磁场产生源，设置在磁场产生源内的衬底，与衬底相对设置的靶和设置在衬底侧的远离 目标。 磁性薄板设置在与基板紧密接触的位置或稍微远离基板的位置，或者可移动地设置在这些位置之间。 当将磁性材料溅射到衬底上时，通过提供薄磁板，可以在衬底表面上产生均匀的磁场。

公开(公告)号：US06224676B1

公开(公告)日：2001-05-01

申请号：US09451911

申请日：1999-12-01

Applicant: Katsunori Nakajima ,  Hiroyuki Shida ,  Eiji Setoyama ,  Koji Ishiguro ,  Hikaru Saruta

Inventor： Katsunori Nakajima ,  Hiroyuki Shida ,  Eiji Setoyama ,  Koji Ishiguro ,  Hikaru Saruta

IPC: C23C1600

CPC classification number: C23C16/44 ,  C23C16/52 ,  H01L21/67017

Abstract: According to the present invention, a signal transmission system is arranged in a region surrounded by a gas control means and a plurality of blocks whereby a region between elements constituting a gas supply flow path can be utilized for the region of the signal transmission system thereby to make the occupying space small and miniaturize the apparatus.

Abstract translation: 根据本发明，信号传输系统被布置在由气体控制装置和多个块包围的区域中，由此构成气体供应流路的元件之间的区域可以用于信号传输系统的区域，从而 使占用空间小，装置小型化。

公开(公告)号：US5116482A

公开(公告)日：1992-05-26

申请号：US587034

申请日：1990-09-24

Applicant: Eiji Setoyama ,  Mitsuhiro Kamei

Inventor： Eiji Setoyama ,  Mitsuhiro Kamei

IPC: C23C14/40 ,  C23C14/34 ,  C23C14/54 ,  H01J37/32

CPC classification number: H01J37/32174 ,  C23C14/54 ,  H01J37/32082 ,  H01J37/32165 ,  H01J37/32935 ,  H01J37/3299 ,  H01J2237/332

Abstract: A film forming system including an evacuating unit, a pair of opposed electrodes and an RF voltage supplying unit for suppling RF voltages to the respective electrodes to generate a discharge between the electrodes to form a film. The film forming system includes: a discharge variation detecting unit for detecting an amount of a variation in the discharge as a voltage from each of the electrodes; and a phase adjusting unit for detecting the difference in phase between the RF voltages supplied to the electrodes, and for adjusting the phase difference of the RF voltages supplied to the electrodes, according to the difference between the detected phase difference and a preset value.

Abstract translation: 一种成膜系统，包括排气单元，一对相对电极和RF电压供应单元，用于向各个电极提供RF电压以在电极之间产生放电以形成膜。 成膜系统包括：放电变化检测单元，用于检测作为每个电极的电压的放电变化量; 以及相位调整单元，用于根据所检测的相位差和预设值之间的差异，检测供给到电极的RF电压之间的相位差，并且用于调整提供给电极的RF电压的相位差。

公开(公告)号：US06196155B1

公开(公告)日：2001-03-06

申请号：US09290169

申请日：1999-04-13

Applicant: Eiji Setoyama ,  Kouji Ishiguro ,  Hajime Murakami ,  Hirofumi Seki

Inventor： Eiji Setoyama ,  Kouji Ishiguro ,  Hajime Murakami ,  Hirofumi Seki

IPC: C23C1600

CPC classification number: H01J37/32862 ,  B08B7/00 ,  C23C16/402 ,  C23C16/517 ,  H01J37/32623 ,  H01J37/32688

Abstract: A plasma processing apparatus comprises a plasma generating chamber including a side wall and a roof-plate to cover the upper part of the side wall, in which plasma is generated; a plurality of magnets, one group of the magnets being arranged on the roof-plate in concentric circles, with the polarity of each magnets in each circle being alternated, and the other group of the magnets being arranged around the side wall of the plasma generating chamber in rings, with the polarity of each magnet in each ring being alternated, to form a cusped magnetic field to confine the plasma in the plasma generating chamber; and a holding device which is provided in the plasma generating chamber, to hold a substrate to be processed with the plasma; wherein the magnet means arranged on the roof-plate and the magnet means arranged around the side wall are held in such a way that they can be moved up and down.

Abstract translation: 等离子体处理装置包括等离子体产生室，其包括侧壁和顶板，以覆盖其中产生等离子体的侧壁的上部; 多个磁体，一组磁体以同心圆布置在屋顶板上，每个圆中的每个磁体的极性交替，另一组磁体围绕等离子体产生的侧壁布置 每个环中的每个磁体的极性交替，以形成一个限定的等离子体在等离子体产生室中的脉冲磁场; 以及保持装置，其设置在所述等离子体产生室中，以用所述等离子体保持待处理的基板; 其中布置在屋顶板上的磁体装置和围绕侧壁布置的磁铁装置被保持为使得它们能够上下移动。

公开(公告)号：US5783055A

公开(公告)日：1998-07-21

申请号：US607431

申请日：1996-02-27

Applicant: Mitsuhiro Kamei ,  Eiji Setoyama ,  Satoshi Umehara

Inventor： Mitsuhiro Kamei ,  Eiji Setoyama ,  Satoshi Umehara

IPC: C23C14/56 ,  H01L21/00

CPC classification number: H01L21/6719 ,  C23C14/568 ,  H01J37/32733 ,  H01J37/34 ,  H01L21/67213

Abstract: A multi-chamber sputtering apparatus characterized in that a plurality of target electrodes and a substrate transfer mechanism which is able to transfer a substrate to positions facing the target electrodes and change distance between the target electrodes and the substrate.

Abstract translation: 一种多室溅射装置，其特征在于，多个目标电极和基板传送机构，其能够将基板传送到面向目标电极的位置，并改变目标电极和基板之间的距离。

公开(公告)号：US5429729A

公开(公告)日：1995-07-04

申请号：US616868

申请日：1990-11-21

Applicant: Mitsuhiro Kamei ,  Eiji Setoyama

Inventor： Mitsuhiro Kamei ,  Eiji Setoyama

IPC: C23C14/34 ,  C23C14/56

CPC classification number: C23C14/3407 ,  C23C14/56

Abstract: In accordance with the present invention, in order to exchange a target under a vacuum condition without communicating a film-forming chamber with the atmosphere for exchange of the target, a substrate is located in a vacuum vessel and an opening portion is provided on a wall surface of the vacuum vessel opposite to the substrate which is formed with a thin film on its surface. A target exchanging chamber is disposed adjacent to the vacuum vessel so as to be communicated therewith through the opening portion. During film-formation, the interior of the vacuum vessel is maintained in a vacuum state by closing the opening portion with the target while the target exchanging chamber is communicated with the atmosphere and a spare target is contained therein. When exchanging the target, the air in the target exchanging chamber is exhausted to maintain the chamber in a vacuum state and the target is replaced with the spare target.

Abstract translation: 根据本发明，为了在真空条件下更换靶，而不使成膜室与用于更换靶的气氛相通，则基板位于真空容器中，开口部分设置在壁上 表面与在其表面上形成有薄膜的基板相对的真空容器的表面。 目标交换室邻近真空容器设置，以便通过开口部与其连通。 在成膜期间，通过在目标交换室与大气连通并且备用目标物被容纳在其中的同时通过用目标物关闭开口部分将真空容器的内部保持在真空状态。 当更换目标时，目标交换室中的空气被排出以将室维持在真空状态，并且目标被替换为备用目标。

公开(公告)号：US5376777A

公开(公告)日：1994-12-27

申请号：US795732

申请日：1991-11-21

Applicant: Mitsuhiro Kamei ,  Eiji Setoyama

Inventor： Mitsuhiro Kamei ,  Eiji Setoyama

IPC: C23C14/34 ,  C23C14/50 ,  C23C14/56 ,  C23C16/54 ,  G07C3/04 ,  G06F15/20 ,  G07B15/02

CPC classification number: G07C3/04

Abstract: The number of times a substrate tray has been used and the amount of distortion of the substrate tray are measured. When the number of times of use or the distortion amount of the substrate tray exceed a predetermined value, respectively, the substrate tray is exchanged automatically.

Abstract translation: 测量基板托盘的使用次数和基板托盘的变形量。 当基板托盘的使用次数或变形量分别超过预定值时，基板托盘被自动更换。

公开(公告)号：US5061356A

公开(公告)日：1991-10-29

申请号：US485526

申请日：1990-02-27

Applicant: Shigeru Tanaka ,  Eiji Setoyama ,  Shinzou Oikawa ,  Sigeki Yamamura

Inventor： Shigeru Tanaka ,  Eiji Setoyama ,  Shinzou Oikawa ,  Sigeki Yamamura

IPC: C23C14/50 ,  C23C14/56 ,  H01L21/687

CPC classification number: H01L21/68792 ,  C23C14/50 ,  C23C14/568

Abstract: A vacuum treatment apparatus includes a vacuum chamber having a first treatment position and at least one second treatment position where a substrate supported on a substrate stage subjected to a vacuum treatment. A drive device is operatively connected to a holding device to drive the same so that the holding device can move the substrate stage between the first and second treatment positions. The drive device is also operable to drive the holding device so that the holding device can rotate the substrate stage about the axis thereof at the first treatment position. A rotating device is provided for rotating the substrate stage about the axis thereof when the substrate stage is disposed at the second treatment position.

Abstract translation: 真空处理装置包括具有第一处理位置的真空室和至少一个第二处理位置，其中支撑在经过真空处理的基板台上的基板。 驱动装置可操作地连接到保持装置以驱动它，使得保持装置可以在第一和第二处理位置之间移动衬底台。 驱动装置还可操作以驱动保持装置，使得保持装置可以在第一处理位置使基板台围绕其轴线旋转。 提供了一种旋转装置，用于当衬底台设置在第二处理位置时使衬底台围绕其轴线旋转。