发明授权
US06232140B1 Semiconductor integrated capacitive acceleration sensor and relative fabrication method
有权
半导体集成电容式加速度传感器及相关制造方法
- 专利标题: Semiconductor integrated capacitive acceleration sensor and relative fabrication method
- 专利标题(中): 半导体集成电容式加速度传感器及相关制造方法
-
申请号: US09458400申请日: 1999-12-10
-
公开(公告)号: US06232140B1公开(公告)日: 2001-05-15
- 发明人: Paolo Ferrari , Mario Foroni , Benedetto Vigna , Flavio Villa
- 申请人: Paolo Ferrari , Mario Foroni , Benedetto Vigna , Flavio Villa
- 优先权: EP96830438 19960731
- 主分类号: H01L2100
- IPC分类号: H01L2100
摘要:
The acceleration sensor is formed in a monocrystalline silicon wafer forming part of a dedicated SOI substrate presenting a first and second monocrystalline silicon wafer separated by an insulting layer having an air gap. A well is formed in the second wafer over the air gap and is subsequently trenched up to the air gap to release the monocrystalline silicon mass forming the movable mass of the sensor; the movable mass has two numbers of movable electrodes facing respective pluralities of fixed electrodes. In the idle condition, each movable electrode is separated by different distances from the two fixed electrodes facing the movable electrode.
信息查询