发明授权
US06232140B1 Semiconductor integrated capacitive acceleration sensor and relative fabrication method 有权
半导体集成电容式加速度传感器及相关制造方法

Semiconductor integrated capacitive acceleration sensor and relative fabrication method
摘要:
The acceleration sensor is formed in a monocrystalline silicon wafer forming part of a dedicated SOI substrate presenting a first and second monocrystalline silicon wafer separated by an insulting layer having an air gap. A well is formed in the second wafer over the air gap and is subsequently trenched up to the air gap to release the monocrystalline silicon mass forming the movable mass of the sensor; the movable mass has two numbers of movable electrodes facing respective pluralities of fixed electrodes. In the idle condition, each movable electrode is separated by different distances from the two fixed electrodes facing the movable electrode.
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