发明授权
US06232245B1 Method of forming interlayer film 有权
形成中间膜的方法

  • 专利标题: Method of forming interlayer film
  • 专利标题(中): 形成中间膜的方法
  • 申请号: US09265232
    申请日: 1999-03-08
  • 公开(公告)号: US06232245B1
    公开(公告)日: 2001-05-15
  • 发明人: Masaki Hara
  • 申请人: Masaki Hara
  • 优先权: JP8-190641 19960719; JP8-216996 19960819
  • 主分类号: H07L2144
  • IPC分类号: H07L2144
Method of forming interlayer film
摘要:
A method of forming an interlayer film on a substrate with a plurality of patterns formed thereon wherein the interlayer film is deposited on the substrate by a process comprising a plurality of steps in each of which a portion of the film is deposited so as to have different fluidity with the same source material.
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