发明授权
- 专利标题: Very stable excimer or molecular fluorine laser
- 专利标题(中): 非常稳定的准分子或分子氟激光
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申请号: US09484818申请日: 2000-01-18
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公开(公告)号: US06243405B1公开(公告)日: 2001-06-05
- 发明人: Stefan Borneis , Klaus Brunwinkel , Uwe Stamm , Frank Voss
- 申请人: Stefan Borneis , Klaus Brunwinkel , Uwe Stamm , Frank Voss
- 主分类号: H01S322
- IPC分类号: H01S322
摘要:
A technique of stabalizing during operation a gas mixture with a gas composition initially provided within a discharge chamber of an excimer or molecular fluorine gas discharge laser includes monitoring a temporal pulse shape of the laser beam and adjusting and/or determining the status of the gas mixture based on the monitored temporal pulse shape. The monitored temporal pulse shape is preferably compared with a reference temporal pulse shape. The difference or deviation between the monitored temporal pulse shape and a reference temporal pulse shape is calculated. The amount of and intervals between gas replenishment actions are determined based on the calculated deviation. The energy of the beam is also monitored and the driving voltage and gas actions are adjusted to stabilize the energy, energy stability and/or energy dose.
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