Very stable excimer or molecular fluorine laser
    1.
    发明授权
    Very stable excimer or molecular fluorine laser 有权
    非常稳定的准分子或分子氟激光

    公开(公告)号:US06243405B1

    公开(公告)日:2001-06-05

    申请号:US09484818

    申请日:2000-01-18

    IPC分类号: H01S322

    摘要: A technique of stabalizing during operation a gas mixture with a gas composition initially provided within a discharge chamber of an excimer or molecular fluorine gas discharge laser includes monitoring a temporal pulse shape of the laser beam and adjusting and/or determining the status of the gas mixture based on the monitored temporal pulse shape. The monitored temporal pulse shape is preferably compared with a reference temporal pulse shape. The difference or deviation between the monitored temporal pulse shape and a reference temporal pulse shape is calculated. The amount of and intervals between gas replenishment actions are determined based on the calculated deviation. The energy of the beam is also monitored and the driving voltage and gas actions are adjusted to stabilize the energy, energy stability and/or energy dose.

    摘要翻译: 在操作期间稳定化技术,其中最初设置在准分子或分子氟气放电激光器的放电室内的气体组成的气体混合物包括监测激光束的时间脉冲形状并调节和/或确定气体混合物的状态 基于监视的时间脉冲形状。 所监视的时间脉冲形状优选地与参考时间脉冲形状进行比较。 计算所监视的时间脉冲形状与参考时间脉冲形状之间的差异或偏差。 基于计算的偏差来确定补充气体动作的量和间隔。 还监测光束的能量,并且调节驱动电压和气体动作以稳定能量,能量稳定性和/或能量剂量。

    Tunable narrowband source of a coherent radiation
    2.
    发明授权
    Tunable narrowband source of a coherent radiation 失效
    可调窄带源的相干辐射

    公开(公告)号:US5663973A

    公开(公告)日:1997-09-02

    申请号:US661229

    申请日:1996-06-10

    IPC分类号: G02F1/39 H01S3/10

    CPC分类号: G02F1/39

    摘要: A tunable narrowband source of a coherent radiation, comprisinga first optical parametric oscillator (OPO1) which includes at least one first optical parametric amplifier medium (K.sub.1) in a resonator (18, 20; 20, 34) or an optical parametric generator;at least one second optical parametric oscillator (OPO2) which includes at least one second optical parametric amplifier medium (K.sub.2) in a resonator (22, 24) and into which is coupled the output radiation (28; 28b) of the first optical parametric oscillator (OPO1);at least one third optical parametric amplifier medium (OPA) into which is coupled the output radiation (30) of the second optical parametric oscillator (OPO2); andmeans (12, 14, 16, 26) for generating and coupling the pump radiation (10, 10') into the first and second optical parametric oscillators (OPO1, OPO2) and into the third optical parametric amplifier medium OPA), whereinthe output radiation (28; 28b) of the first optical parametric oscillator (OPO1) which is coupled into the second optical parametric oscillator (OPO2) has a bandwidth which is smaller than the spacing of the only one longitudinal mode is excited and coupled into the third optical parametric amplifier medium (K.sub.3, K.sub.4) and amplified therein.

    摘要翻译: 包括相干辐射的可调窄带源,包括第一光参量振荡器(OPO1),其包括在谐振器(18,20; 20,34)中的至少一个第一光参量放大器介质(K1)或光参量发生器; 至少一个第二光参量振荡器(OPO2),其包括在谐振器(22,24)中的至少一个第二光参量放大器介质(K2),其中耦合到所述第一光参量振荡器的输出辐射(28; 28b) (OPO1); 至少一个第三光参量放大器介质(OPA),其耦合到所述第二光参量振荡器(OPO2)的输出辐射(30); 以及用于产生并将泵浦辐射(10,10')耦合到第一和第二光学参量振荡器(OPO1,OPO2)并进入第三光学参量放大器介质OPA的装置(12,14,16,26)),其中 耦合到第二光参量振荡器(OPO2)中的第一光参量振荡器(OPO1)的输出辐射(28; 28b)具有小于仅一个纵模的间隔的带宽被激发并耦合到第三光参参振荡器 光学参量放大器介质(K3,K4)并在其中放大。

    Production of narrow-band coherent radiation by using at least one
optical parametric oscillator
    3.
    发明授权
    Production of narrow-band coherent radiation by using at least one optical parametric oscillator 失效
    通过使用至少一个光学参数振荡器来生产窄带相干辐射

    公开(公告)号:US5896220A

    公开(公告)日:1999-04-20

    申请号:US906523

    申请日:1997-08-05

    IPC分类号: G02F1/39

    CPC分类号: G02F1/39

    摘要: A source of narrow-band coherent radiation has a first optical parametric oscillator (OPO 1) for producing seed radiation, and a second optical parametric oscillator (OPO 2), into which the seed radiation is input after passing through a wavelength-selective element (G). In order to stabilize and adjust the bandwidth of the radiation (14) emitted by the second optical parametric oscillator (OPO 2), radiation of this type is also input into the wavelength-selective element (G) and thereby analyzed, in order, in accordance with the analysis, to adjust the wavelength-selective element or the OPO 2.

    摘要翻译: 窄带相干辐射源具有用于产生种子辐射的第一光学参量振荡器(OPO 1)和第二光学参量振荡器(OPO 2),种子辐射在通过波长选择元件之后被输入其中 G)。 为了稳定和调整由第二光参量振荡器(OPO 2)发射的辐射(14)的带宽,这种类型的辐射也被输入到波长选择元件(G)中,从而依次分析 按照分析,调整波长选择元素或OPO 2。

    Tunable, optical parametric oscillator
    4.
    发明授权
    Tunable, optical parametric oscillator 失效
    可调谐光参量振荡器

    公开(公告)号:US5661595A

    公开(公告)日:1997-08-26

    申请号:US626505

    申请日:1996-04-02

    IPC分类号: G02F1/39

    CPC分类号: G02F1/39

    摘要: A tunable, optical, parametric oscillator including at least one non-linear optical crystal (10) comprises a first deflector mirror (18) arranged inside the resonator between the resonator mirror (12) and the crystal (10) to couple in the pump radiation (16) as well as a second deflector mirror (20) arranged outside the resonator behind a second resonator mirror (14) to separate the pump radiation (22) from the radiation (24) generated in the optical parametric oscillator.

    摘要翻译: 包括至少一个非线性光学晶体(10)的可调谐光学参量振荡器包括布置在谐振器反射镜(12)和晶体(10)之间的谐振器内部的第一偏转镜(18),以在泵浦辐射 (16)以及布置在谐振器外部的第二谐振镜(14)之后的第二偏转镜(20),以将泵浦辐射(22)与在光学参量振荡器中产生的辐射(24)分离。

    Method and Device for Producing Extreme Ultraviolet Radiation or Soft X-Ray Radiation
    5.
    发明申请
    Method and Device for Producing Extreme Ultraviolet Radiation or Soft X-Ray Radiation 有权
    用于产生极紫外辐射或软X射线辐射的方法和装置

    公开(公告)号:US20080116400A1

    公开(公告)日:2008-05-22

    申请号:US10562496

    申请日:2003-06-27

    IPC分类号: H05G2/00 H01J35/14

    CPC分类号: H05G2/008 H05G2/003 H05G2/005

    摘要: A device for generating extreme ultraviolet (EUV) or soft X-ray radiation comprising: a laser source for producing a laser radiation which is focused to intensities beyond 106 W/cm2 onto a target to produce a plasma; and said electrodes located around the path of the plasma produced by the laser source; and said electrodes being combined with components for producing a rapid electric discharge in the plasma with a characteristic time constant which is less than the time constant of the laser produced plasma expansion time.

    摘要翻译: 一种用于产生极紫外(EUV)或软X射线辐射的装置,包括:用于产生激光辐射的激光源,其被聚焦到超过10 6 / W 2 / >到目标上以产生等离子体; 并且所述电极位于由激光源产生的等离子体的路径周围; 并且所述电极与用于在等离子体中产生快速放电的部件组合,其特征时间常数小于激光产生的等离子体膨胀时间的时间常数。

    Method and apparatus for wavelength calibration

    公开(公告)号:US06608848B2

    公开(公告)日:2003-08-19

    申请号:US09849600

    申请日:2001-05-04

    IPC分类号: H01S313

    CPC分类号: H01S3/1392 H01S3/225

    摘要: A wavelength calibration system determines an absolute wavelength of a narrowed spectral emission band of an excimer or molecular laser system. The system includes a module including an element which optically interacts with a component of an output beam of the laser within the tunable range of the laser system around the narrowed band. An inter-level resonance is detected by monitoring changes in voltage within the module, or photo-absorption is detected by photodetecting equipment. The absolute wavelength of the narrowed band is precisely determinable when the optical transitions occur and are detected. When the system specifically includes an ArF-excimer laser chamber, the module is preferably a galvatron containing an element that photo-absorbs around 193 nm and the element is preferably a gas or vapor selected from the group consisting of arsenic, carbon, oxygen, iron, gaseous hydrocarbons, halogenized hydrocarbons, carbon-contaminated inert gases, germanium and platinum vapor. When the system specifically includes F2-laser chamber, the module is preferably a galvatron containing an element that photo-absorbs around 157 nm and the element is preferably a gas or vapor selected from the group consisting of selenium, bromine and silicon. The module is alternatively a purge chamber configurable for purging with a photo-absorbing gas.

    Line-narrowing module for high power laser

    公开(公告)号:US06560254B2

    公开(公告)日:2003-05-06

    申请号:US10077327

    申请日:2002-02-15

    申请人: Uwe Stamm

    发明人: Uwe Stamm

    IPC分类号: H01S313

    摘要: An excimer or molecular fluorine laser includes a gain medium surrounded by a resonator and including a line-narrowing module preferably including a prism beam expander and one or more etalons and/or a grating or grism within the resonator. The material of transmissive portions of the line-narrowing module including the prisms and the plates of the etalons comprises a material having an absorption coefficient of less than 5×10−3/cm at 248 nm incident radiation, less than 10×10−3/cm at 193 nm incident radiation, and less than 0.1/cm at 157 nm. Preferably the material also has a thermal conductivity greater than 2.0 W/m° C.

    Diode pumped laser with frequency conversion into UV and DUV range
    8.
    发明授权
    Diode pumped laser with frequency conversion into UV and DUV range 失效
    二极管泵浦激光器具有频率转换为UV和DUV范围

    公开(公告)号:US6002697A

    公开(公告)日:1999-12-14

    申请号:US139214

    申请日:1998-08-24

    IPC分类号: G02F1/35 G02F1/37 H01S3/04

    摘要: A solid state laser is provided including a rare earth-doped YAG, YLF, YVO, GSGG, YALO or GdVO oscillator crystal, at least one laser diode pumping source, a Q-switch short pulse generator, a frequency doubling stage and frequency quadrupling or quintupling stages. The frequency quadrupling or quintupling stages include a nonlinear optical crystal such as CLBO, BBO or LBO built into a housing. The housing is sealed off to prevent external moisture and other atmospheric impurities from accessing the crystal at its interior. The housing interior is configured for purging with one or more external inert gases or dry air through valve controls. The housing is equipped with a mechanism for controlling the temperature of the interior of the housing, and consequently for controlling the temperature of the crystal. The temperature controlling mechanism enables heating and cooling of the crystal, as well as maintaining the crystal at a constant selected temperature. The housing includes optical windows transparent for input and output radiation.

    摘要翻译: 提供固体激光器,其包括稀土掺杂YAG,YLF,YVO,GSGG,YALO或GdVO振荡晶体,至少一个激光二极管泵浦源,Q开关短脉冲发生器,倍频级和倍频四倍或 五倍的阶段 频率四倍或五倍级包括内置在外壳中的非线性光学晶体,例如CLBO,BBO或LBO。 外壳被密封以防止外部水分和其他大气杂质进入其内部的水晶。 外壳内部配置为通过一个或多个外部惰性气体或干燥空气通过阀门控制进行清洗。 壳体配备有用于控制壳体内部的温度的机构,并且因此用于控制晶体的温度。 温度控制机构能够对晶体进行加热和冷却,并且将晶体保持在恒定的选定温度。 外壳包括透明的输入和输出辐射的光学窗口。

    Method and device for producing extreme ultraviolet radiation or soft X-ray radiation
    10.
    发明授权
    Method and device for producing extreme ultraviolet radiation or soft X-ray radiation 有权
    用于产生极紫外辐射或软X射线辐射的方法和装置

    公开(公告)号:US07619232B2

    公开(公告)日:2009-11-17

    申请号:US10562496

    申请日:2003-06-27

    IPC分类号: H05G2/00

    CPC分类号: H05G2/008 H05G2/003 H05G2/005

    摘要: A device for generating extreme ultraviolet (EUV) or soft X-ray radiation comprising: a laser source for producing a laser radiation which is focused to intensities beyond 106 W/cm2 onto a target to produce a plasma; and said electrodes located around the path of the plasma produced by the laser source; and said electrodes being combined with components for producing a rapid electric discharge in the plasma with a characteristic time constant which is less than the time constant of the laser produced plasma expansion time.

    摘要翻译: 一种用于产生极紫外(EUV)或软X射线辐射的装置,包括:用于产生激光辐射的激光源,所述激光辐射被聚焦到目标上超过106W / cm 2的强度以产生等离子体; 并且所述电极位于由激光源产生的等离子体的路径周围; 并且所述电极与用于在等离子体中产生快速放电的部件组合,其特征时间常数小于激光产生的等离子体膨胀时间的时间常数。