发明授权
US06245484B1 Polymides, process for producing the same and photosensitive composition the same
有权
聚酰亚胺,其制备方法和含有它们的光敏组合物
- 专利标题: Polymides, process for producing the same and photosensitive composition the same
- 专利标题(中): 聚酰亚胺,其制备方法和含有它们的光敏组合物
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申请号: US09496098申请日: 2000-02-01
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公开(公告)号: US06245484B1公开(公告)日: 2001-06-12
- 发明人: Lin-chiu Chiang , Jenq-Tain Lin , Nobuyuki Sensui
- 申请人: Lin-chiu Chiang , Jenq-Tain Lin , Nobuyuki Sensui
- 优先权: JP10-150742 19980514; JP10-236385 19980807
- 主分类号: G03C173
- IPC分类号: G03C173
摘要:
Polyimide is produced by reacting two kinds of diamine compounds consisting of diaminopolysiloxane and a carboxyl group-containing diamine or three kinds of diamine compounds consisting of diaminopolysiloxane, a carboxyl group-containing diamine and an aromatic or alicyclic diamine with a dicarboxylic acid anhydride having a 2,5-dioxotetrahydrofuryl group as one acid anhydride group, thereby once forming a polyamic acid, and subjecting the polyamic acid to polyimidization reaction. The resulting polyimide itself is soluble in low boiling organic solvents for general purpose use, typically methyl ethyl ketone. A photosensitive composition comprising the polyimide, a photo crosslinking agent and a photo acid-generating agent forms a negative type polyimide pattern upon development with an aqueous alkali solution.
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