发明授权
US06258666B1 Method of producing semiconductor thin film and method of producing solar cell using same
失效
制造半导体薄膜的方法和使用其制造太阳能电池的方法
- 专利标题： Method of producing semiconductor thin film and method of producing solar cell using same
- 专利标题（中）： 制造半导体薄膜的方法和使用其制造太阳能电池的方法
-
申请号： US09333019申请日： 1999-06-15
-
公开(公告)号： US06258666B1公开(公告)日： 2001-07-10
- 发明人: Masaki Mizutani , Isao Tanikawa , Katsumi Nakagawa , Tatsumi Shoji , Noritaka Ukiyo , Yukiko Iwasaki
- 申请人： Masaki Mizutani , Isao Tanikawa , Katsumi Nakagawa , Tatsumi Shoji , Noritaka Ukiyo , Yukiko Iwasaki
- 优先权： JP10-171403 19980618; JP11-159374 19990607
- 主分类号： H01L21336
- IPC分类号： H01L21336
摘要：
Provided is a method of producing a semiconductor thin film wherein while a semiconductor thin film formed on a substrate is supported on a curved surface of a support member having the curved surface, the support member is rotated, thereby peeling the semiconductor thin film away from the substrate. Also provided is a method of producing a semiconductor thin film having the step of peeling a semiconductor thin film formed on a substrate away from the substrate, wherein the peeling step is carried out after the substrate is secured on a substrate support member without an adhesive. These provide the method of peeling the semiconductor thin film away from the substrate without damage and the method of holding the substrate without contamination.
信息查询
