发明授权
- 专利标题: Low resistance fill for deep trench capacitor
- 专利标题(中): 深沟槽电容器的低电阻填充
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申请号: US09626328申请日: 2000-07-26
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公开(公告)号: US06258689B1公开(公告)日: 2001-07-10
- 发明人: Gary B. Bronner , Jeffrey P. Gambino , Jack A. Mandelman , Rick L. Mohler , Carl Radens , William R. Tonti
- 申请人: Gary B. Bronner , Jeffrey P. Gambino , Jack A. Mandelman , Rick L. Mohler , Carl Radens , William R. Tonti
- 主分类号: H01L2120
- IPC分类号: H01L2120
摘要:
Trench capacitors are fabricated utilizing a method which results in a metallic nitride as a portion of a node electrode in a lower region of the trench. The metallic nitride-containing trench electrode exhibits reduced series resistance compared to conventional trench electrodes of similar dimensions, thereby enabling reduced ground rule memory cell layouts and/or reduced cell access time. The trench capacitors of the invention are especially useful as components of DRAM memory cells having various trench configuration and design.
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