发明授权
US06258689B1 Low resistance fill for deep trench capacitor 失效
深沟槽电容器的低电阻填充

Low resistance fill for deep trench capacitor
摘要:
Trench capacitors are fabricated utilizing a method which results in a metallic nitride as a portion of a node electrode in a lower region of the trench. The metallic nitride-containing trench electrode exhibits reduced series resistance compared to conventional trench electrodes of similar dimensions, thereby enabling reduced ground rule memory cell layouts and/or reduced cell access time. The trench capacitors of the invention are especially useful as components of DRAM memory cells having various trench configuration and design.
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