发明授权
- 专利标题: Approach to formulating irradiation sensitive positive resists
- 专利标题(中): 制定辐射敏感阳性抗蚀剂的方法
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申请号: US09473225申请日: 1999-12-27
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公开(公告)号: US06268436B1公开(公告)日: 2001-07-31
- 发明人: Kuang-Jung Chen , Ronald A. DellaGuardia , Wu-Song Huang , Ahmad D. Katnani , Mahmoud M. Khojasteh , Quighuang Lin
- 申请人: Kuang-Jung Chen , Ronald A. DellaGuardia , Wu-Song Huang , Ahmad D. Katnani , Mahmoud M. Khojasteh , Quighuang Lin
- 主分类号: C08L6500
- IPC分类号: C08L6500
摘要:
The present invention is directed to a high-performance irradiation sensitive positive-tone resist and to a method of formulating the same. In one aspect, the polymer resin composition of the present invention comprises a blend of at least two miscible aqueous base soluble polymer resins, wherein one of said aqueous base soluble polymer resins of said blend is partially protected with a high activation energy protecting group and the other aqueous base soluble polymer resin of said blend is partially protected with a low activation energy protecting group. A chemically amplified resist system comprising said polymer resin composition; at least one acid generator; and a solvent is also provided herein.