发明授权
US06268919B1 System and method for measuring thin film properties and analyzing two-dimensional histograms using and/not operations
失效
用于测量薄膜性质的系统和方法,并使用和/或操作分析二维直方图
- 专利标题: System and method for measuring thin film properties and analyzing two-dimensional histograms using and/not operations
- 专利标题(中): 用于测量薄膜性质的系统和方法,并使用和/或操作分析二维直方图
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申请号: US09376151申请日: 1999-08-17
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公开(公告)号: US06268919B1公开(公告)日: 2001-07-31
- 发明人: Steven W. Meeks , Rusmin Kudinar , Ronny Soetarman
- 申请人: Steven W. Meeks , Rusmin Kudinar , Ronny Soetarman
- 主分类号: G01B2117
- IPC分类号: G01B2117
摘要:
A system and method for measuring lubricant thickness and degradation, carbon wear and carbon thickness, and surface roughness of thin film magnetic disks at angles that are not substantially Brewster's angle of the thin film (carbon) protective overcoat. A focused optical light whose polarization can be switched between P or S polarization is incident at an angle to the surface of the thin film magnetic disk. The range of angles can be from zero degrees from normal to near Brewster's angle and from an angle greater than Brewster's angle to 90 degrees. This range of angles allows the easy measurement of the change in lubricant thickness due to the interaction of the thin film head, the absolute lubricant thickness and degradation of the lubricant. It also allows the measurement of changes in carbon thickness and the absolute carbon thickness. The surface roughness can also be measured at any of the angles specified above. The present invention utilizes a first and second histogram representing disk properties (1) at two different time periods, (2) at two different locations on the disk, or (3) on two different disks.
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