利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

40 条记录 (耗时 0.018 秒)

    System and method for measuring object characteristics using phase differences in polarized light reflections
    2.
    发明授权
    System and method for measuring object characteristics using phase differences in polarized light reflections 失效
    使用偏振光反射相位差来测量物体特性的系统和方法

    公开(公告)号：US06956658B2

    公开(公告)日：2005-10-18

    申请号：US10660984

    申请日：2003-09-12

    申请人： Steven W. Meeks ,  Rusmin Kudinar

    发明人： Steven W. Meeks ,  Rusmin Kudinar

    IPC分类号： G01B11/06 ,  G01B11/30 ,  G01N21/21 ,  G01N21/47 ,  G01N21/95 ,  G11B5/84

    CPC分类号： G01B11/303 ,  G01B11/065 ,  G01N21/211

    摘要： A system and method for performing a magnetic imaging, optical profiling, and measuring lubricant thickness and degradation, carbon wear, carbon thickness, and surface roughness of thin film magnetic disks and silicon wafers at angles that are not substantially Brewster's angle of the thin film (carbon) protective overcoat is provided. The system and method involve a focused optical light whose polarization can be switched between P or S polarization is incident at an angle to the surface of the thin film magnetic disk. This generates both reflected and scattered light that may be measured to determine various values and properties related to the surface of the disk, including identifying the Kerr-effect in reflected light for determination of point magnetic properties. In addition, the present invention can mark the position of an identified defect.

    摘要翻译： 用于以基本上不是薄膜的布鲁斯特角的角度执行磁性成像，光学轮廓和测量润滑剂厚度和降解，碳磨损，碳厚度和薄膜磁盘和硅晶片的表面粗糙度的系统和方法（ 碳）保护罩。 该系统和方法涉及一种聚焦的光，其偏振可以在P或S之间切换，偏振以一定角度入射到薄膜磁盘的表面。 这产生可以测量的反射和散射光，以确定与盘的表面相关的各种值和性质，包括识别用于确定点磁性的反射光中的克尔效应。 此外，本发明可以标识所识别的缺陷的位置。

    Multi-surface scattered radiation differentiation
    3.
    发明授权
    Multi-surface scattered radiation differentiation 有权
    多面散射辐射分化

    公开(公告)号：US08848181B1

    公开(公告)日：2014-09-30

    申请号：US13861383

    申请日：2013-04-12

    申请人： Steven W. Meeks ,  Rusmin Kudinar ,  Hung P. Nguyen

    发明人： Steven W. Meeks ,  Rusmin Kudinar ,  Hung P. Nguyen

    IPC分类号： G01N21/00 ,  G01N21/958

    CPC分类号： G01N21/958 ,  G01N21/896 ,  G01N2021/8967

    摘要： An optical inspector includes a radiating source, a time varying beam reflector, a telecentric scan lens, a first and second waveplate, a polarizing beam splitter, a first detector, a focusing lens, a blocker, and a second detector. The radiating source irradiates the first waveplate generating circularly polarized source beam that irradiates a first position of on the time varying beam reflector with a source beam. The time varying beam reflector directs the source beam to the telecentric scan lens, which in turn directs the source beam to a sample. Reflected radiation from a sample is directed to the second waveplate generating linearly polarized beam that irradiates the polarizing beam splitter which directs a portion of the reflected radiation to the first detector. Scattered radiation from the sample is directed by the focusing lens to the second detector. Contemporaneous measurements by the first and second detectors are compared to differentiate.

    摘要翻译： 光学检查器包括辐射源，时变光束反射器，远心扫描透镜，第一和第二波片，偏振分束器，第一检测器，聚焦透镜，阻挡器和第二检测器。 辐射源照射产生圆偏振源光束的第一波片，其用源光束照射时变光束反射器上的第一位置。 时变光束反射器将源光束引导到远心扫描透镜，然后将远光扫描透镜引导到源样品。 来自样品的反射辐射被引导到产生线偏振光束的第二波片，该线偏振光束照射偏振分束器，其将一部分反射辐射引导到第一检测器。 来自样品的散射辐射由聚焦透镜引导到第二检测器。 将第一和第二检测器的同期测量值进行比较。

    Optical inspector with selective scattered radiation blocker
    4.
    发明授权
    Optical inspector with selective scattered radiation blocker 有权
    具有选择性散射辐射阻挡剂的光学检查员

    公开(公告)号：US08836935B1

    公开(公告)日：2014-09-16

    申请号：US13861382

    申请日：2013-04-12

    申请人： Steven W. Meeks ,  Rusmin Kudinar ,  Hung P. Nguyen

    发明人： Steven W. Meeks ,  Rusmin Kudinar ,  Hung P. Nguyen

    IPC分类号： G01N21/00 ,  G01N21/958

    CPC分类号： G01N21/958 ,  G01N2021/8967

    摘要： An optical inspector includes a radiating source, a time varying beam reflector, a telecentric scan lens, a blocker, a focusing lens, an aperture, and a detector. The radiating source irradiates a first position of on the time varying beam reflector with a source beam. The time varying beam reflector directs the source beam to the telecentric scan lens, which in turn directs the source beam to a transparent sample. A portion of the source beam travels through the transparent sample to another surface. The blocker blocks scattered radiation originating at the other surface. Scattered radiation originating from the transparent sample is not redirected by the blocker and is focused by the focusing lens to a first focal plane. The focused scattered radiation passes through the aperture before irradiating the detector. The detector output an intensity measurement of the scattered radiation that irradiates the detector.

    摘要翻译： 光学检查器包括辐射源，时变光束反射器，远心扫描透镜，阻挡器，聚焦透镜，孔径和检测器。 辐射源用源光束照射时变光束反射器上的第一位置。 时变光束反射器将源光束引导到远心扫描透镜，然后再将源光束引导到透明样品。 源光束的一部分穿过透明样品到另一表面。 阻断剂阻止源于另一个表面的散射辐射。 来自透明样品的散射辐射不被阻断剂重新导向，并被聚焦透镜聚焦到第一焦平面。 聚焦的散射辐射在照射检测器之前穿过孔。 检测器输出照射检测器的散射辐射的强度测量值。

    Wafer Edge Inspection
    5.
    发明申请
    Wafer Edge Inspection 有权
    晶圆边缘检查

    公开(公告)号：US20090059236A1

    公开(公告)日：2009-03-05

    申请号：US11848234

    申请日：2007-08-30

    申请人： Steven W. Meeks ,  Rusmin Kudinar

    发明人： Steven W. Meeks ,  Rusmin Kudinar

    IPC分类号： G01N21/55 ,  G02F1/29

    CPC分类号： G01N21/9501 ,  G01B11/065 ,  G01N21/9503 ,  G01N21/9506

    摘要： In one embodiment, a surface analyzer system comprises a radiation targeting assembly to target radiation onto an edge surface of a wafer, the radiation targeting assembly comprising a first expanded paraboloid or expanded ellipsoid reflector positioned adjacent the edge surface of the wafer, a reflected radiation collecting assembly that collects radiation reflected from the surface, a signal processing module to generate surface parameter data from the reflected radiation, and a defect detection module to analyze the surface parameter data to detect a defect on the surface.

    摘要翻译： 在一个实施例中，表面分析器系统包括辐射瞄准组件以将辐射瞄准晶片的边缘表​​面，所述辐射瞄准组件包括邻近所述晶片的边缘表​​面定位的第一扩展的抛物面或扩展的椭球反射器，反射的辐射收集 收集从表面反射的辐射的组件，用于从反射辐射产生表面参数数据的信号处理模块，以及用于分析表面参数数据以检测表面上的缺陷的缺陷检测模块。

    System and method for simultaneously measuring thin film layer thickness, reflectivity, roughness, surface profile and magnetic pattern in thin film magnetic disks and silicon wafers
    9.
    发明授权
    System and method for simultaneously measuring thin film layer thickness, reflectivity, roughness, surface profile and magnetic pattern in thin film magnetic disks and silicon wafers 失效
    用于同时测量薄膜磁盘和硅片中的薄膜层厚度，反射率，粗糙度，表面轮廓和磁性图案的系统和方法

    公开(公告)号：US06665078B1

    公开(公告)日：2003-12-16

    申请号：US09414388

    申请日：1999-10-07

    申请人： Steven W. Meeks ,  Rusmin Kudinar

    发明人： Steven W. Meeks ,  Rusmin Kudinar

    IPC分类号： G01B1106

    CPC分类号： G01B11/303 ,  G01B11/065 ,  G01N21/211

    摘要： A system and method for performing a magnetic imaging, optical profiling, and measuring lubricant thickness and degradation, carbon wear, carbon thickness, and surface roughness of thin film magnetic disks and silicon wafers at angles that are not substantially Brewster's angle of the thin film (carbon) protective overcoat is provided. The system and method involve a focused optical light whose polarization can be switched between P or S polarization is incident at an angle to the surface of the thin film magnetic disk. This generates both reflected and scattered light that may be measured to determine various values and properties related to the surface of the disk, including identifying the Kerr-effect in reflected light for determination of point magnetic properties. In addition, the present invention can mark the position of an identified defect.

    摘要翻译： 用于以基本上不是薄膜的布鲁斯特角的角度执行磁性成像，光学轮廓和测量润滑剂厚度和降解，碳磨损，碳厚度和薄膜磁盘和硅晶片的表面粗糙度的系统和方法（ 碳）保护罩。 该系统和方法涉及一种聚焦的光，其偏振可以在P或S之间切换，偏振以一定角度入射到薄膜磁盘的表面。 这产生可以测量的反射和散射光，以确定与盘的表面相关的各种值和性质，包括识别用于确定点磁性的反射光中的克尔效应。 此外，本发明可以标识所识别的缺陷的位置。

    Wafer handling apparatus
    10.
    发明授权
    Wafer handling apparatus 失效
    晶圆处理装置

    公开(公告)号：US4597708A

    公开(公告)日：1986-07-01

    申请号：US616979

    申请日：1984-06-04

    申请人： William R. Wheeler ,  Rusmin Kudinar ,  George J. Kren ,  David D. Clementson

    发明人： William R. Wheeler ,  Rusmin Kudinar ,  George J. Kren ,  David D. Clementson

    IPC分类号： H01L21/677 ,  B65G1/06

    CPC分类号： H01L21/67766 ,  Y10T74/1892 ,  Y10T74/1896

    摘要： A wafer handler featuring a carriage movable along a rail path, the carriage supporting an upright rotatable arm with a cantilevered wafer chuck. Elevators for raising and lowering trays containing wafer stacks are disposed on either side of the rail path. Each elevator has a curved track section which may be interposed along the rail path. The upright arm has a track follower, parallel to a boom supporting the wafer chuck and freely movable along the rail path, except when it encounters a curved track section. In this instance, the track follower will follow the curved track section, causing rotation of the arm, boom and wafer chuck, bringing the chuck into the wafer stack at an elevation determined by the elevator. In this manner, motion in the X, Y and Z planes may be provided for stacked wafers over extended distances.

    摘要翻译： 具有可沿轨道移动的支架的晶片处理器，该支架支撑具有悬臂晶片卡盘的直立可旋转臂。 用于升高和降低包含晶片堆叠的托盘的升降机设置在轨道的任一侧。 每个电梯具有弯曲的轨道部分，其可以沿着轨道路线插入。 直立臂具有轨道跟随器，平行于支撑晶片卡盘的悬臂，并且可以沿着轨道路径自由移动，除非它遇到弯曲的轨道部分。 在这种情况下，跟踪跟随器将跟随弯曲的轨道部分，引起臂，吊臂和晶片卡盘的旋转，使得卡盘以电梯确定的仰角进入晶片堆叠。 以这种方式，X，Y和Z平面中的运动可以用于延长距离上的堆叠晶片。