发明授权
- 专利标题： Method to remove metals in a scrubber
- 专利标题（中）： 去除洗涤器中金属的方法
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申请号： US08615520申请日： 1996-03-11
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公开(公告)号： US06274059B1公开(公告)日： 2001-08-14
- 发明人: Wilbur C. Krusell , Igor J. Malik
- 申请人： Wilbur C. Krusell , Igor J. Malik
- 主分类号： B44C122
- IPC分类号： B44C122
摘要：
A method to remove metal contaminants in a substrate cleaning process. The present invention may replace or be used in conjunction with other substrate cleaning systems. This method comprises adding a citric acid solution to the liquid medium of a semiconductor substrate cleaning system. This method is described in the manner it is used in conjunction with a scrubber wherein both sides of a wafer are scrubbed.