发明授权
US06274290B1 Raster scan gaussian beam writing strategy and method for pattern generation 失效
光栅扫描高斯光束写入策略和图案生成方法

  • 专利标题: Raster scan gaussian beam writing strategy and method for pattern generation
  • 专利标题(中): 光栅扫描高斯光束写入策略和图案生成方法
  • 申请号: US09179361
    申请日: 1998-10-26
  • 公开(公告)号: US06274290B1
    公开(公告)日: 2001-08-14
  • 发明人: Lee H. VeneklasenWilliam Devore
  • 申请人: Lee H. VeneklasenWilliam Devore
  • 主分类号: G03C500
  • IPC分类号: G03C500
Raster scan gaussian beam writing strategy and method for pattern generation
摘要:
A hybrid exposure strategy for pattern generation uses wide field raster scan deflection and a uniformly moving stage to expose long stripes. Periodic analog wide field magnetic scan is augmented by a high speed electrostatic retrograde scan to keep the beam essentially stationary during exposure of rectangular flash fields and/or Gaussian beams. In this manner a staircase deflection trajectory is created for the beam. The position and dose data for each flash is derived from a rasterized data format using a decoder device.
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