公开(公告)号：US20070145269A1

公开(公告)日：2007-06-28

申请号：US11537062

申请日：2006-09-29

Applicant: BENYAMIN BULLER ,  William Devore ,  Juergen Frosien ,  Richard Lozes ,  Henry Pearce-Percy ,  Dieter Winkler

Inventor： BENYAMIN BULLER ,  William Devore ,  Juergen Frosien ,  Richard Lozes ,  Henry Pearce-Percy ,  Dieter Winkler

IPC: G21K7/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/244 ,  H01J2237/004 ,  H01J2237/0213 ,  H01J2237/0262 ,  H01J2237/2448 ,  H01J2237/24571

Abstract: Methods and apparatus to facilitate the measurement of the amount of scattered electrons collected by an anti-fogging baffle arrangement are provided. For some embodiments, by affixing a lead to an electrically isolated (floating) portion of the baffle arrangement, the amount of scattered electrons collected thereby may be read out, for example, as a current signal. Thus, for such embodiments, the baffle arrangement may double as a detector, allowing an image of surface (e.g., a mask or substrate surface) to be generated.

Abstract translation: 提供了有助于测量由防雾挡板装置收集的散射电子量的方法和装置。 对于一些实施例，通过将引线附接到挡板装置的电隔离（浮动）部分，由此收集的散射电子的量可以例如被读出为电流信号。 因此，对于这样的实施例，挡板装置可以作为检测器加倍，从而允许产生表面（例如，掩模或衬底表面）的图像。

公开(公告)号：US20070057617A1

公开(公告)日：2007-03-15

申请号：US11286802

申请日：2005-11-22

Applicant: Steven Coyle ,  Michael Scheinfein ,  William Devore

Inventor： Steven Coyle ,  Michael Scheinfein ,  William Devore

IPC: H01J29/46 ,  H01J29/50

CPC classification number: H01J37/065 ,  H01J37/143 ,  H01J2237/06316 ,  H01J2237/06341

Abstract: An electron beam source for use in an electron gun. The electron beam source includes an emitter terminating in a tip. The emitter is configured to generate an electron beam. The electron beam source further includes a suppressor electrode laterally surrounding the emitter such that the tip of the emitter protrudes through the suppressor electrode and an extractor electrode disposed adjacent the tip of the emitter. The extractor electrode comprises a magnetic disk whose magnetic field is aligned with an axis of the electron beam.

Abstract translation: 一种用于电子枪的电子束源。 电子束源包括终端在尖端中的发射器。 发射极被配置为产生电子束。 电子束源还包括横向围绕发射器的抑制电极，使得发射极的尖端突出通过抑制电极和与发射极的顶端相邻设置的提取电极。 提取器电极包括其磁场与电子束的轴线对齐的磁盘。

公开(公告)号：US20070075256A1

公开(公告)日：2007-04-05

申请号：US11241789

申请日：2005-09-30

Applicant: Benyamin Buller ,  William Devore ,  Juergen Frosien ,  Eugene Mirro ,  Henry Pearce-Percy ,  Dieter Winkler

Inventor： Benyamin Buller ,  William Devore ,  Juergen Frosien ,  Eugene Mirro ,  Henry Pearce-Percy ,  Dieter Winkler

IPC: H01J37/147

CPC classification number: H01J37/147 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/24 ,  H01J37/3174 ,  H01J2237/0432 ,  H01J2237/1504 ,  H01J2237/28

Abstract: An apparatus and method for deflecting electron beams with high precision and high throughput. At least one electrode of a deflecting capacitor is connected to a signal source via a coaxial cable. A termination resistor is further connected to the coaxial cable and the electrode at the joint of the coaxial cable and the electrode. The termination resistor has a resistance matched to the impedance of the coaxial cable and the electrode has an impedance matched to half of the impedance of the coaxial. The deflecting capacitors of the present invention have a minimized loss of precision due to eddy current. The spacing of electrodes in the deflecting capacitors is reduced by a factor of approximately two compared to the state-the-art system.

公开(公告)号：US06274290B1

公开(公告)日：2001-08-14

申请号：US09179361

申请日：1998-10-26

Applicant: Lee H. Veneklasen ,  William Devore

Inventor： Lee H. Veneklasen ,  William Devore

IPC: G03C500

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/31764 ,  H01J2237/31766 ,  H01J2237/31776 ,  Y10S430/143

Abstract: A hybrid exposure strategy for pattern generation uses wide field raster scan deflection and a uniformly moving stage to expose long stripes. Periodic analog wide field magnetic scan is augmented by a high speed electrostatic retrograde scan to keep the beam essentially stationary during exposure of rectangular flash fields and/or Gaussian beams. In this manner a staircase deflection trajectory is created for the beam. The position and dose data for each flash is derived from a rasterized data format using a decoder device.

Abstract translation: 用于图案生成的混合曝光策略使用宽场光栅扫描偏转和均匀移动的阶段来暴露长条纹。 通过高速静电逆行扫描来增加定期的模拟广域磁扫描，以在矩形闪光场和/或高斯光束的曝光期间保持光束基本静止。 以这种方式，为梁形成了阶梯偏转轨迹。 每个闪存的位置和剂量数据都是从使用解码器设备的光栅化数据格式导出的。

公开(公告)号：US20070075262A1

公开(公告)日：2007-04-05

申请号：US11241880

申请日：2005-09-30

Applicant: Dieter Winkler ,  Henry Pearce-Percy ,  Juergen Frosien ,  William Devore

Inventor： Dieter Winkler ,  Henry Pearce-Percy ,  Juergen Frosien ,  William Devore

IPC: H01J37/147

CPC classification number: H01J37/1477 ,  H01J2237/1518 ,  H01J2237/28 ,  H01J2237/3175

Abstract: Embodiments of the present invention may be utilized to improve electron beam deflection. One embodiment provides an electrostatic deflection system with electrodes that minimize aberrations and to achieve vertical incidence simultaneously. By using at least two stages of deflection for a deflection direction, the present invention allows the deflected electron beam to pass a back focal plane of an objective lens while deflection capacitors are not disposed across the back focal plane. As a result, deflection electrodes can have an angle of 120° to minimize aberrations and simultaneously achieve vertical incidence of the electron beam on a target to avoid distortions or changes in magnification with height variations of the target or focus variations.

Abstract translation: 本发明的实施例可用于改善电子束偏转。 一个实施例提供一种静电偏转系统，其具有最小化像差并且同时实现垂直入射的电极。 通过对偏转方向使用至少两个偏转级，本发明允许偏转的电子束通过物镜的后焦平面，而偏转电容器不跨过后焦平面设置。 结果，偏转电极可以具有120°的角度以最小化像差并且同时实现电子束在靶上的垂直入射，以避免目标或焦点变化的高度变化引起的变形或放大变化。

公开(公告)号：US5876902A

公开(公告)日：1999-03-02

申请号：US789247

申请日：1997-01-28

Applicant: Lee H. Veneklasen ,  William DeVore ,  R. L. Smith ,  Robin Teitzel

Inventor： Lee H. Veneklasen ,  William DeVore ,  R. L. Smith ,  Robin Teitzel

IPC: H01J37/302 ,  H01J37/317 ,  G03C5/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3026 ,  H01J37/3174 ,  H01J2237/31764 ,  H01J2237/31766 ,  H01J2237/31776 ,  Y10S430/143

Abstract: A hybrid exposure strategy for pattern generation uses wide field raster scan deflection and a uniformly moving stage to expose long stripes. Periodic analog wide field magnetic scan is augmented by a high speed electrostatic retrograde scan to keep the beam stationary during exposure of rectangular flash fields. The system's data path utilizes a pattern represented in a rasterized format. Intermediate vector data bases are created using fracture rules that limit feature and hierarchical cell size of to be smaller than overlapping fringes of stripe data fields. Rectangular flash fields are employed with each field being a 1 by n array of writing pixels. The length, origin position and dose of line shaped beam flashes can be varied to allow patterns to be exposed on a design grid much smaller than a writing pixel. The length, origin position and dose data for each flash is derived from a rasterized data format using a decoder device. In this manner multiple writing pixels are exposed simultaneously without compromising resolution or diagonal line edge roughness, thus enhancing exposure rate. A high flash rate is assured by including astigmatic illumination to maximize beam current, and leveraged co-planar blanking and shaping deflection to minimize drive voltages.

Abstract translation: 用于图案生成的混合曝光策略使用宽场光栅扫描偏转和均匀移动的阶段来暴露长条纹。 通过高速静电逆行扫描来增加定期的模拟广域磁扫描，以在矩形闪光场的曝光期间保持光束的静止。 系统的数据路径使用以光栅化格式表示的模式。 使用将特征和分层细胞大小限制为小于条带数据域的重叠条纹的断裂规则创建中间向量数据库。 采用矩形闪光场，每个场是1×n个写入像素阵列。 可以改变线形光束闪光的长度，原点位置和剂量，以允许图案暴露在比写入像素小得多的设计网格上。 每个闪存的长度，原始位置和剂量数据都是从使用解码器设备的光栅化数据格式导出的。 以这种方式，同时曝光多个写入像素而不损害分辨率或对角线边缘粗糙度，从而提高曝光率。 通过包括散光照明来最大限度地提高束电流，以及利用共面消隐和成形偏转以最小化驱动电压来确保高闪速。

公开(公告)号：US5376505A

公开(公告)日：1994-12-27

申请号：US852272

申请日：1992-03-16

Applicant: Steven D. Berger ,  William DeVore

Inventor： Steven D. Berger ,  William DeVore

IPC: H01J37/317 ,  G03F9/00

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3174

Abstract: Fabrication of 0.25 gm design rule or smaller devices on chips, that may attain levels of 256 megabit or higher depends upon lithographic patterning by use of accelerated charged particle beams. Fabrication is expedited by acceleration values resulting in deBroglie wavelengths at least in order of magnitude smaller than such design rule to permit cost saving both in fabricating apparatus and resulting devices. Most importantly, such wavelength values permit significant variation in spatial angle of incidence of beam to wafer to permit both large instantaneous exposure areas and in temporal angle of incidence to expedite beam scanning as emitted from a fixed particle source.

Abstract translation: 通过使用加速带电粒子束，可能达到256兆位或更高级别的0.25 gm设计规则或芯片上的较小器件的制造取决于光刻图案化。 通过加速度值加速，导致deBroglie波长至少比这种设计规则小的数量级，以允许在制造装置和所得到的装置中节省成本。 最重要的是，这样的波长值允许光束到晶片的空间入射角度的显着变化，以允许大的瞬时曝光区域和时间入射角，从而从固定的粒子源发射来加快光束扫描。

公开(公告)号：US4081844A

公开(公告)日：1978-03-28

申请号：US710832

申请日：1976-08-02

Applicant: Ernest William Devore ,  Judson Allen McDowell

Inventor： Ernest William Devore ,  Judson Allen McDowell

IPC: G11B15/087 ,  G11B20/12 ,  G11B27/10 ,  G11B27/30 ,  G11B5/09

CPC classification number: G11B20/12 ,  G11B27/3027

Abstract: Each data record portion on a record member includes preamble signals for synchronizing recording apparatus with respect to data signals recorded in juxtaposition to the preamble signals. A plurality of beginning of data indicators are interleaved in the synchronizing signals for providing a plurality of independent but coacting beginning of data location pointers. Enhanced apparatus includes means responsive to any one of the location pointers to ensure a reliable start of data indication.

Abstract translation: 记录构件上的每个数据记录部分包括用于使记录装置相对于与前置信号并置记录的数据信号同步的前置信号。 多个开始的数据指示符在同步信号中被交织，以提供多个独立的但并行的数据位置指针的开始。 增强装置包括响应于位置指针中的任何一个的装置，以确保可靠地开始数据指示。

公开(公告)号：US3979771A

公开(公告)日：1976-09-07

申请号：US559635

申请日：1975-03-19

Applicant: William Devore Taggart, Jr. ,  Franklin Satoshi Itami

Inventor： William Devore Taggart, Jr. ,  Franklin Satoshi Itami

IPC: G11B20/10 ,  G11B20/20 ,  G11B5/09

CPC classification number: G11B20/10212 ,  G11B20/20

Abstract: This digital circuit generates a window during which the data bit transitions of phase encoded data may be read from magnetic tape. This circuit contemplates a system for reading nine track tape and comprises one phase lock loop and window generator for each track, and the logic and control circuitry necessary to deskew and output the data in the form of nine bit bytes. Each phase lock loop is individually free to correct itself to conform to the variations of its own track, and the control circuit can compensate for a total skew of up to four bit times.

Abstract translation: 该数字电路产生窗口，在该窗口期间可以从磁带读取相位编码数据的数据位转换。 该电路设想用于读取九磁道磁带的系统，并且包括用于每个磁道的一个锁相环和窗口发生器，以及以9位字节的形式进行偏斜和输出数据所需的逻辑和控制电路。 每个锁相环都可以单独自行修正，以符合其自身轨道的变化，并且控制电路可以补偿高达四位时间的总偏移。

公开(公告)号：US20070085033A1

公开(公告)日：2007-04-19

申请号：US11243363

申请日：2005-10-03

Applicant: Benyamin Buller ,  William DeVore ,  Juergen Frosien ,  Xinrong Jiang ,  Richard Lozes ,  Henry Pearce-Percy ,  Dieter Winkler ,  Steven Coyle ,  Helmut Banzhof

Inventor： Benyamin Buller ,  William DeVore ,  Juergen Frosien ,  Xinrong Jiang ,  Richard Lozes ,  Henry Pearce-Percy ,  Dieter Winkler ,  Steven Coyle ,  Helmut Banzhof

IPC: G21G5/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J2237/31754

Abstract: An electron beam column comprises a thermal field emission electron source to generate an electron beam, an electron beam blanker, a beam shaping module, and electron beam optics comprising a plurality of electron beam lenses. In one version, the optical parameters of the electron beam blanker, beam shaping module, and electron beam optics are set to achieve an acceptance semi-angle β of from about ¼ to about 3 mrads, where the acceptance semi-angle β is the half the angle subtended by the electron beam at the writing plane. The beam-shaping module can also operate as a single lens using upper and lower projection lenses. A multifunction module for an electron beam column is also described.

Abstract translation: 电子束柱包括产生电子束的热场发射电子源，电子束消除器，光束整形模块和包括多个电子束透镜的电子束光学器件。 在一个版本中，电子束消隐器，光束整形模块和电子束光学器件的光学参数被设置为实现约¼至约3mrads的接受半角β，其中接受半角β是半 在写平面处电子束对着的角度。 光束成形模块也可以使用上下投影透镜作为单个透镜进行操作。 还描述了用于电子束柱的多功能模块。