发明授权
- 专利标题: Process for photorefractive index grating formation
- 专利标题(中): 光折射光栅形成工艺
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申请号: US08230659申请日: 1994-04-21
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公开(公告)号: US06280884B1公开(公告)日: 2001-08-28
- 发明人: Gary Carl Bjorklund , William Esco Moerner , Scott Meixner Silence
- 申请人: Gary Carl Bjorklund , William Esco Moerner , Scott Meixner Silence
- 主分类号: G03H102
- IPC分类号: G03H102
摘要:
The present invention relates to an improved process for photorefractive index grating formation utilizing polymeric photorefractive materials. The process involves the steps of: (i) exposing a polymeric optical article to electromagnetic radiation having an intensity of at least 0.05 W/cm2 for a short period of time to achieve an absorbed energy/unit volume of at least 1×103 J/cm3 to activate the article, and (ii) exposing the polymeric optical article to an electric field and electromagnetic radiation to form an index grating.
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