Process for photorefractive index grating formation
    1.
    发明授权
    Process for photorefractive index grating formation 失效
    光折射光栅形成工艺

    公开(公告)号:US06280884B1

    公开(公告)日:2001-08-28

    申请号:US08230659

    申请日:1994-04-21

    IPC分类号: G03H102

    摘要: The present invention relates to an improved process for photorefractive index grating formation utilizing polymeric photorefractive materials. The process involves the steps of: (i) exposing a polymeric optical article to electromagnetic radiation having an intensity of at least 0.05 W/cm2 for a short period of time to achieve an absorbed energy/unit volume of at least 1×103 J/cm3 to activate the article, and (ii) exposing the polymeric optical article to an electric field and electromagnetic radiation to form an index grating.

    摘要翻译: 本发明涉及利用聚合光折射材料的光折射光栅形成的改进方法。 该方法包括以下步骤:(i)将聚合物光学制品暴露于具有至少0.05W / cm 2的强度的电磁辐射短时间以达到吸收的能量/单位体积至少为1×103J / cm3至 激活物品,和(ii)将聚合物光学物品暴露于电场和电磁辐射以形成折射光栅。