发明授权
- 专利标题： Photosensitive composition, method for forming pattern using the same, and method for manufacturing electronic parts
- 专利标题（中）： 光敏组合物，使用其形成图案的方法，以及电子部件的制造方法
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申请号： US08997623申请日： 1997-12-23
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公开(公告)号： US06280897B1公开(公告)日： 2001-08-28
- 发明人: Koji Asakawa , Naoko Kihara , Naomi Shida , Toru Ushirogouchi , Takeshi Okino , Makoto Nakase , Takuya Naito , Satoshi Saito
- 申请人： Koji Asakawa , Naoko Kihara , Naomi Shida , Toru Ushirogouchi , Takeshi Okino , Makoto Nakase , Takuya Naito , Satoshi Saito
- 优先权： JP8-344037 19961224; JP9-008819 19970121; JP9-189929 19970715
- 主分类号： G03F7004
- IPC分类号： G03F7004
摘要：
A photosensitive composition comprising a polymer having a repeating segment represented by the following general formula (1A) and a compound which is capable of generating an acid by irradiation of an actinic radiation. wherein R11 is a hydrogen atom, an aliphatic hydrocarbon group, an alcoxy group, a halogen atom or a cyano group, R12 is an aliphatic hydrocarbon group or a cyclic olefin, R13 is either one of (a) a straight-chain olefin having 2 to 12 carbon atoms, a cyclic olefin or a heterocyclic group and (b) a hydrocarbon group represented by — (CH2)m—(m is an integer of 3 to 9), and R14 is a hydrophilic group.
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