发明授权
- 专利标题: Non-abrasive conditioning for polishing pads
- 专利标题(中): 抛光垫的非磨料调理
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申请号: US09264067申请日: 1999-03-08
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公开(公告)号: US06283836B1公开(公告)日: 2001-09-04
- 发明人: Clinton Fruitman , Mark Meloni , John Natalicio
- 申请人: Clinton Fruitman , Mark Meloni , John Natalicio
- 主分类号: B24B2900
- IPC分类号: B24B2900
摘要:
A method and apparatus for resurfacing a polishing pad using non-abrasive techniques. These techniques include shaving, milling, or planing the upper working surface of the polishing pad using an edged cutting tool to alter the microtexture and micro-topology of the surface to produce a desired surface contour or planarity. This precise conditioning of the microscopic features of the polishing pad surface controls dishing in workpieces during polishing.
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