发明授权
- 专利标题: Substrate cleaning apparatus and method
- 专利标题(中): 基板清洗装置及方法
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申请号: US09071683申请日: 1998-05-01
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公开(公告)号: US06286525B1公开(公告)日: 2001-09-11
- 发明人: Joichi Nishimura , Akihiko Morita , Masami Ohtani
- 申请人: Joichi Nishimura , Akihiko Morita , Masami Ohtani
- 优先权: JP9-117809 19970508
- 主分类号: B08B300
- IPC分类号: B08B300
摘要:
A plurality of cleaning devices of the same type are attached to one support arm. The cleaning devices are simultaneously moved over a surface to be cleaned of a substrate supported and spun by a substrate supporting and spinning mechanism. Thus, the same type of cleaning devices share the task of cleaning the entire surface of the substrate, thereby to improve cleaning efficiency and shorten cleaning time. Different types of cleaning devices may be attached to the support arm for simultaneous cleaning of the entire surface of the substrate. Where different types of cleaning brushes are attached to the support arm, a cleaning operation may be carried out by simultaneously using cleaning brushes of optimal hardness for different regions on the substrate surface.
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