公开(公告)号：US6060697A

公开(公告)日：2000-05-09

申请号：US39141

申请日：1998-03-13

申请人： Akihiko Morita ,  Masami Ohtani ,  Yasuo Imanishi ,  Masao Tsuji ,  Masaki Iwami ,  Joichi Nishimura ,  Kazuhiro Nishimura ,  Tetsuya Hamada ,  Satoshi Yamamoto ,  Kenji Kamei

发明人： Akihiko Morita ,  Masami Ohtani ,  Yasuo Imanishi ,  Masao Tsuji ,  Masaki Iwami ,  Joichi Nishimura ,  Kazuhiro Nishimura ,  Tetsuya Hamada ,  Satoshi Yamamoto ,  Kenji Kamei

IPC分类号： H01L21/02 ,  G05D23/19 ,  H02J3/00 ,  H02J13/00 ,  H05B1/02

CPC分类号： G05D23/1951

摘要： A substrate processing apparatus reduces an instantaneous maximum power consumption at turn-on. Power receiving parts of a plurality of processing units are connected to one end of a turn-on switch respectively through switches. The other end of the turn-on switch is connected to an external power source through a breaker. Timer values are set in advance in the timers, respectively. When the turn-on switch is turned on, the timers turn on the associated switches respectively after times which are defined by the timer values, whereby the processing units are provided with electric power, each with a delay of a constant time.

摘要翻译： 基板处理装置降低开启时的瞬时最大功耗。 多个处理单元的受电部分分别通过开关连接到导通开关的一端。 导通开关的另一端通过断路器连接到外部电源。 定时器值分别在定时器中设置。 当接通开关接通时，定时器分别在由定时器值定义的时间之后分别关闭相应的开关，由此处理单元被提供电力，每个具有恒定时间的延迟。

公开(公告)号：US06260562B1

公开(公告)日：2001-07-17

申请号：US09166593

申请日：1998-10-06

申请人： Kenya Morinishi ,  Masami Ohtani ,  Joichi Nishimura ,  Akihiko Morita

发明人： Kenya Morinishi ,  Masami Ohtani ,  Joichi Nishimura ,  Akihiko Morita

IPC分类号： B08B302

CPC分类号： H01L21/67051 ,  B05C11/08 ,  Y10S134/902

摘要： A substrate cleaning apparatus includes a spin support for supporting and spinning a substrate, a nozzle for discharging a cleaning liquid with a given cleaning condition from a discharge opening, a moving mechanism for moving the nozzle at least between center and edge of the substrate, a cleaning condition adjuster for adjusting the cleaning condition, and a controller for controlling the cleaning condition adjuster to vary the cleaning condition according to a cleaning liquid supply position movable over the substrate surface.

摘要翻译： 基板清洗装置包括用于支撑和旋转基板的旋转支撑件，用于从排出口排出具有给定清洁条件的清洁液体的喷嘴，用于至少在基板的中心和边缘之间移动喷嘴的移动机构， 清洁条件调节器，用于调节清洁状态;以及控制器，用于控制清洁状态调节器，以根据可移动到基板表面上的清洁液体供应位置来改变清洁状态。

公开(公告)号：US06051101A

公开(公告)日：2000-04-18

申请号：US39824

申请日：1998-03-16

申请人： Masami Ohtani ,  Yasuo Imanishi ,  Masao Tsuji ,  Takanori Kawamoto ,  Masaki Iwami ,  Joichi Nishimura ,  Akihiko Morita

发明人： Masami Ohtani ,  Yasuo Imanishi ,  Masao Tsuji ,  Takanori Kawamoto ,  Masaki Iwami ,  Joichi Nishimura ,  Akihiko Morita

IPC分类号： B65G49/07 ,  H01L21/00 ,  H01L21/027 ,  H01L21/677 ,  B65H1/00

CPC分类号： H01L21/67161 ,  H01L21/67178 ,  H01L21/67742 ,  H01L21/67745

摘要： A unit arrangement part comprises a chemical cabinet on its lowermost part, while coating units for forming a resist film on a substrate and developing units for developing the substrate after exposure are arranged on four corners of an apparatus above the chemical cabinet. Further, multistage thermal processing units for thermal-processing the substrate are arranged on front and rear portions of the apparatus above these wet processing units. A cleaning unit for supplying a cleaning liquid such as pure water and cleaning the substrate is arranged on a front side of the apparatus between the coating units as a substrate processing unit. Thus provided is a substrate processing apparatus having excellent workability in maintenance with a high degree of freedom in arrangement of processing units.

摘要翻译： 单元布置部分包括在其最下部分的化学柜，而在基板上形成抗蚀剂膜的涂布单元和曝光后用于显影基板的显影单元布置在化学柜上方的设备的四个角上。 此外，用于热处理基板的多级热处理单元布置在这些湿处理单元上方的设备的前部和后部。 在作为基板处理单元的涂布单元之间的设备的前侧设置有用于供应诸如纯水的清洁液体并清洁基板的清洁单元。 因此，提供了一种具有优异的维护可加工性的基板处理装置，并且处理单元的布置自由度高。

公开(公告)号：US06286525B1

公开(公告)日：2001-09-11

申请号：US09071683

申请日：1998-05-01

申请人： Joichi Nishimura ,  Akihiko Morita ,  Masami Ohtani

发明人： Joichi Nishimura ,  Akihiko Morita ,  Masami Ohtani

IPC分类号： B08B300

CPC分类号： H01L21/67051 ,  B08B1/04 ,  B08B3/00 ,  H01L21/67046 ,  Y10S134/902

摘要： A plurality of cleaning devices of the same type are attached to one support arm. The cleaning devices are simultaneously moved over a surface to be cleaned of a substrate supported and spun by a substrate supporting and spinning mechanism. Thus, the same type of cleaning devices share the task of cleaning the entire surface of the substrate, thereby to improve cleaning efficiency and shorten cleaning time. Different types of cleaning devices may be attached to the support arm for simultaneous cleaning of the entire surface of the substrate. Where different types of cleaning brushes are attached to the support arm, a cleaning operation may be carried out by simultaneously using cleaning brushes of optimal hardness for different regions on the substrate surface.

摘要翻译： 多个相同类型的清洁装置连接到一个支撑臂。 清洁装置同时移动到由基板支撑和旋转机构支撑和纺出的基板的待清洁表面上。 因此，相同类型的清洁装置共享清洁基板的整个表面的任务，从而提高清洁效率并缩短清洁时间。 可以将不同类型的清洁装置连接到支撑臂上，以同时清洁基板的整个表面。 在不同类型的清洁刷附接到支撑臂的情况下，清洁操作可以通过同时使用基板表面上不同区域的最佳硬度的清洁刷进行。

公开(公告)号：US6062852A

公开(公告)日：2000-05-16

申请号：US60422

申请日：1998-04-14

申请人： Takanori Kawamoto ,  Masami Ohtani ,  Yasuo Imanishi ,  Masao Tsuji ,  Masaki Iwami ,  Joichi Nishimura ,  Akihiko Morita

发明人： Takanori Kawamoto ,  Masami Ohtani ,  Yasuo Imanishi ,  Masao Tsuji ,  Masaki Iwami ,  Joichi Nishimura ,  Akihiko Morita

IPC分类号： H01L21/683 ,  F27D5/00 ,  H01L21/027 ,  H01L21/68

CPC分类号： H01L21/67109 ,  H01L21/67178 ,  H01L21/68728 ,  H01L21/68742

摘要： A substrate heat-treating apparatus includes a heat-treating plate, and support pins extending through the heat-treating plate to be vertically movable relative thereto. The support pins support each substrate at a lower surface thereof such that edges of the substrate are at a higher level than a central region of the substrate. This construction facilitates air flows into and out of a space between the lower surface of the substrate and the upper surface of the heat-treating plate when the substrate is vertically moved.

摘要翻译： 基板热处理装置包括热处理板和延伸穿过热处理板以相对于其垂直移动的支撑销。 支撑销在其下表面处支撑每个基板，使得基板的边缘处于比基板的中心区域更高的水平。 当基板垂直移动时，这种结构便于空气流入和流出基板的下表面和热处理板的上表面之间的空间。

公开(公告)号：US6159291A

公开(公告)日：2000-12-12

申请号：US131558

申请日：1998-08-10

申请人： Akihiko Morita ,  Joichi Nishimura ,  Masami Ohtani

发明人： Akihiko Morita ,  Joichi Nishimura ,  Masami Ohtani

IPC分类号： B05B15/02 ,  B05B15/10 ,  B05C11/08 ,  B05B13/02

CPC分类号： B05B15/10 ,  B05C11/08 ,  B05B12/1472 ,  B05B15/02

摘要： A substrate treating apparatus for treating a substrate in a predetermined substrate treating region. Each holder arm is supported in a proximal end portion thereof by an arm support to be swingable about a pivotal axis. In time of substrate treatment, the arm support is raised by an air cylinder. With the ascent of the arm support, a cam follower attached to a proximal end of the holder arm is guided by a cam groove. The holder arm, while being raised, turns from a vertical standby posture to a horizontal posture for treating the substrate. As a result, a treating device attached to a distal end of the holder arm moves to a treating position. In the treating position, the treating device treats the substrate. The holder arms are maintained in the vertical standby posture when out of use in substrate treatment. Thus, the holder arms require a reduced standby space.

摘要翻译： 一种用于处理预定基板处理区域中的基板的基板处理装置。 每个保持臂通过臂支撑件在其近端部分中支撑以围绕枢转轴线摆动。 在基板处理的时候，臂支撑件被气缸升高。 随着臂支撑件的上升，附接到保持器臂的近端的凸轮从动件由凸轮槽引导。 保持臂同时被升起，从垂直待机姿态变为水平姿势，用于处理基板。 结果，附接到保持臂的远端的处理装置移动到处理位置。 在处理位置，处理装置处理基板。 当基板处理不用时，保持臂保持在垂直待机姿态。 因此，支架臂需要减少的待机空间。

公开(公告)号：US06790286B2

公开(公告)日：2004-09-14

申请号：US10047818

申请日：2002-01-15

申请人： Joichi Nishimura ,  Masami Ohtani ,  Kenji Hashinoki ,  Masayoshi Shiga ,  Koji Hashimoto

发明人： Joichi Nishimura ,  Masami Ohtani ,  Kenji Hashinoki ,  Masayoshi Shiga ,  Koji Hashimoto

IPC分类号： B05C1100

CPC分类号： H01L21/67178 ,  H01L21/67766 ,  Y10S414/135 ,  Y10S414/137

摘要： Substrate processing parts are stacked and arranged in a multistage manner around a transport robot arranged at the center of a processing area. Rotary application units are arranged on a second layer through an indexer and the transport robot. Rotary developing units are stacked above the rotary application units respectively on a fourth layer located above the second layer. Multistage thermal processing units and an edge exposure unit are horizontally arranged in line above the indexer. In place of the processing units, inspection units performing a macro defect inspection and pattern line width measurement may be arranged in the upside region of the indexer space.

摘要翻译： 衬底处理部件以布置在处理区域的中心的运输机器人的方式堆叠并布置成多级。 旋转应用单元通过分度器和输送机器人布置在第二层上。 旋转显影单元分别堆叠在位于第二层上方的第四层上的旋转施加单元上方。 多级热处理单元和边缘曝光单元在分度器上方水平排列。 代替处理单元，执行宏缺陷检查和图案线宽度测量的检查单元可以布置在分度器空间的上侧区域中。

公开(公告)号：US20050204196A1

公开(公告)日：2005-09-15

申请号：US11078192

申请日：2005-03-11

申请人： Joichi Nishimura ,  Masami Ohtani

发明人： Joichi Nishimura ,  Masami Ohtani

IPC分类号： H01L21/02 ,  G06F11/00 ,  H01L21/00

CPC分类号： H01L21/67253 ,  H01L21/67276

摘要： A moving image representing a maintenance method is reflected on a moving image display section in an operation panel. A worker can grasp the maintenance method by seeing the moving image displayed on the moving image display section. Consequently, maintenance can be performed in a short time and accurately in accordance with the moving image displayed on the moving image display section.

摘要翻译： 表示维护方法的运动图像被反映在操作面板中的运动图像显示部分上。 工人可以通过看到运动图像显示部分上显示的运动图像来掌握维护方法。 因此，可以根据运动图像显示部分上显示的运动图像在短时间内准确地进行维护。

公开(公告)号：US06790287B2

公开(公告)日：2004-09-14

申请号：US09942153

申请日：2001-08-29

申请人： Masayoshi Shiga ,  Kenji Hashinoki ,  Masami Ohtani ,  Joichi Nishimura

发明人： Masayoshi Shiga ,  Kenji Hashinoki ,  Masami Ohtani ,  Joichi Nishimura

IPC分类号： C23C1600

CPC分类号： H01L21/67207 ,  H01L21/67253

摘要： An inspection unit is provided in a substrate processing apparatus performing resist coating processing and development processing on a substrate. In the inspection unit, a film thickness measuring device, a line width measuring device, an overlay measuring device and a macro defect inspection device are successively stacked and arranged from below. The inspection unit is provided on an intermediate portion of a substrate transport path formed in the substrate processing apparatus. The substrate processed in the substrate processing apparatus is selectively introduced into each inspection part. Therefore, the apparatus can properly inspect the substrate at need while suppressing reduction of the throughput. Thus provided are a substrate processing apparatus and a substrate inspection method capable of properly inspecting a substrate while suppressing reduction of the throughput.

摘要翻译： 在基板上进行抗蚀剂涂布处理和显影处理的基板处理装置中设置有检查单元。 在检查单元中，从下方依次堆叠并布置膜厚测量装置，线宽测量装置，覆盖测量装置和宏观缺陷检查装置。 检查单元设置在形成在基板处理装置中的基板输送路径的中间部。 将在基板处理装置中处理的基板选择性地导入各检查部。 因此，能够在抑制生产量的降低的同时适当地检查需要的基板。 这样提供了能够在抑制生产量降低的同时适当地检查基板的基板处理装置和基板检查方法。

公开(公告)号：US5829087A

公开(公告)日：1998-11-03

申请号：US529832

申请日：1995-09-18

申请人： Joichi Nishimura ,  Tadashi Sasaki ,  Masami Ohtani

发明人： Joichi Nishimura ,  Tadashi Sasaki ,  Masami Ohtani

IPC分类号： A46B13/04 ,  H01L21/304

CPC分类号： H01L21/67046

摘要： A cleaning brush is fixed to a cleaner support that is mounted to a rotary element for vertical movement with respect thereto. The rotary element is rotatably supported by a forward portion of a support arm that is pivotable about a vertical axis at the rear of the support arm. A closed space defined by a bellows is connected to air piping having a pressure gauge and a regulator. The regulator is operable in response to variations of pressure resulting from engagement of the cleaning brush with a substrate, to control pressure within said bellows whereby the latter expands and contracts to raise or lower the cleaner support relative to the substrate as required to maintain the pressure in a predetermined range. The aforesaid construction responds fast enough to allow the cleaning brush to follow warping of the substrate with facility, and by so doing clean an entire substrate surface uniformly.

摘要翻译： 清洁刷被固定到安装到旋转元件上用于相对于其垂直移动的清洁器支撑件。 旋转元件由支撑臂的前部可旋转地支撑，支撑臂的前部可在支撑臂的后部围绕垂直轴线枢转。 由波纹管限定的封闭空间连接到具有压力计和调节器的空气管道。 调节器可响应于清洁刷与衬底的接合而产生的压力的变化而操作，以控制所述波纹管内的压力，从而当所述波纹管膨胀并收缩时，根据需要使清洁器支撑件相对于基板升高或降低以维持压力 在预定范围内。 上述结构足够快地响应于清洁刷使设备跟随基板翘曲，并且通过这样清洁整个基板表面均匀。