发明授权
- 专利标题: Self-aligned deep trench isolation to shallow trench isolation
- 专利标题(中): 自对准深沟槽隔离到浅沟槽隔离
-
申请号: US09599699申请日: 2000-06-22
-
公开(公告)号: US06297127B1公开(公告)日: 2001-10-02
- 发明人: Bomy A. Chen , Liang-Kai Han , Robert Hannon , Jay G. Harrington , Herbert L. Ho , Hsing-Jen Wann
- 申请人: Bomy A. Chen , Liang-Kai Han , Robert Hannon , Jay G. Harrington , Herbert L. Ho , Hsing-Jen Wann
- 主分类号: H01L2176
- IPC分类号: H01L2176
摘要:
Shallow trench isolation is combined with optional deep trenches that are self-aligned with the shallow trenches, at the corners of the shallow trenches, and have a deep trench width that is controlled by the thickness of a temporary sidewall deposited in the interior of the shallow trench and is limited by the sidewall deposition thickness of the deep trench fill.
信息查询