发明授权
- 专利标题： X-ray mask, and exposure method and apparatus using the same
- 专利标题（中）： X射线掩模和使用其的曝光方法和装置
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申请号： US08857466申请日： 1997-05-16
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公开(公告)号： US06317479B1公开(公告)日： 2001-11-13
- 发明人: Keiko Chiba , Masami Tsukamoto , Yutaka Watanabe , Shinichi Hara , Hiroshi Maehara
- 申请人： Keiko Chiba , Masami Tsukamoto , Yutaka Watanabe , Shinichi Hara , Hiroshi Maehara
- 优先权： JP8-123594 19960517; JP8-133516 19960528
- 主分类号： H01L2700
- IPC分类号： H01L2700
摘要：
An X-ray mask includes a mask pattern formed on a surface, a detachable protection cover attached on the surface for forming a dust-proof space for protecting the mask pattern, the protection cover being detached when the mask pattern is exposed with X-rays, and a hole for ventilating between the dust-proof space and an outer atmosphere.