发明授权
US06326674B1 Integrated injection logic devices including injection regions and tub or sink regions
有权
集成注入逻辑器件,包括注入区域和槽或汇点区域
- 专利标题: Integrated injection logic devices including injection regions and tub or sink regions
- 专利标题(中): 集成注入逻辑器件,包括注入区域和槽或汇点区域
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申请号: US09451623申请日: 1999-11-30
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公开(公告)号: US06326674B1公开(公告)日: 2001-12-04
- 发明人: Jong-Hwan Kim , Tae-Hoon Kwon , Cheol-Joong Kim , Suk-Kyun Lee
- 申请人: Jong-Hwan Kim , Tae-Hoon Kwon , Cheol-Joong Kim , Suk-Kyun Lee
- 优先权: KR96-45305 19961011; KR97-46600 19970910
- 主分类号: H01L29735
- IPC分类号: H01L29735
摘要:
A complementary bipolar transistor having a lateral npn bipolar transistor, a vertical and a lateral pnp bipolar transistor, an integrated injection logic, a diffusion capacitor, a polysilicon capacitor and polysilicon resistors are disclosed. The lateral pnp bipolar transistor has an emitter region and a collector region which includes high-density regions and low-density regions, and the emitter region is formed in an n type tub region. In the integrated injection logic circuit, collector regions are surrounded by a high-density p type region, and low-density p type regions are formed under the collector regions. The diffusion capacitor and the polysilicon capacitor are formed in one substrate. The diffusion regions except the regions formed by diffusing the impurities in the polysilicon resistors into the epitaxial layer are formed before forming the polysilicon resistors, and polysilicon electrodes are formed along with the polysilicon resistors.
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