- 专利标题: Surface treatment method and system
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申请号: US09525124申请日: 2000-03-14
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公开(公告)号: US06332425B1公开(公告)日: 2001-12-25
- 发明人: Naoyuki Kofuji , Shin Arai , Kazunori Tsujimoto , Tatsumi Mizutani , Keizo Suzuki , Kenichi Mizuishi
- 申请人: Naoyuki Kofuji , Shin Arai , Kazunori Tsujimoto , Tatsumi Mizutani , Keizo Suzuki , Kenichi Mizuishi
- 优先权: JP6-293688 19941104
- 主分类号: C23C1600
- IPC分类号: C23C1600
摘要:
A pulse voltage of duty ratio 5% or below and repetition frequency 400 KHz or above is supplied in order to suppress the notch, charge build-up damage, subtrench and bowing due to the electron shading phenomenon. Thus, a cycle for accelerating electrons occurs in the substrate bias, so that the electron shading phenomenon does not occur.
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