发明授权
- 专利标题: Radiation sensitive material and method for forming pattern
- 专利标题(中): 辐射敏感材料及其形成方法
-
申请号: US09438416申请日: 1999-11-12
-
公开(公告)号: US06344304B1公开(公告)日: 2002-02-05
- 发明人: Satoshi Takechi , Makoto Takahashi , Yuko Kaimoto
- 申请人: Satoshi Takechi , Makoto Takahashi , Yuko Kaimoto
- 优先权: JP5-337434 19931228
- 主分类号: G03F7004
- IPC分类号: G03F7004
![Radiation sensitive material and method for forming pattern](/abs-image/US/2002/02/05/US06344304B1/abs.jpg.150x150.jpg)
摘要:
A radiation sensitive composition comprising a copolymer having a structural unit of (me)acrylonitrile and a structural unit generating an alkali soluble group and a substance generating an acid by application of radiation.